Fluorine Adsorption and Etching on Si(111):SiH Surface during Immersion in HF Solution
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概要
- 論文の詳細を見る
We examined the infrared spectrum of Si(111) after terminating its surface with silicon monohydride and immersing it in various concentrations of HF solution to induce fluorine adsorption. After immersion in HF solution, a part of the silicon monohydride surface was etched and (100), (010) and (001) steps composed of strained dihydrides appeared. The silicon-hydrogen stretching frequency for the monohydride was shifted by the fluorine adsorption. Angle-resolved X-ray photoelectron spectroscopy revealed that fluorine penetrates the silicon lattice as well as exists close to the surface. We conclude that fluorine does not terminate the surface silicon dangling bond but inhabits interstitial sites just below the silicon surface.
- 社団法人応用物理学会の論文
- 1992-06-15
著者
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WATANABE Satoru
Fujitsu Laboratories Ltd.
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SHIGENO Mayumi
Fujitsu Laboratories Lid.
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Shigeno M
Ulsi Technology Laboratory Fujitsu Laboratories Ltd.
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Watanabe Satoru
Fujita Health University
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