High-Density Layer at the SiO_2/Si Interface Observed by Difference X-Ray Reflectivity
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-01-15
著者
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KOMIYA Satoshi
Fujitsu Laboratories Ltd.
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Komiya Satoshi
Fujitsu Laboratories Lid.
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SUGITA Yoshihiro
Fujitsu Laboratories Ltd.
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AWAJI Naoki
Fujitsu Laboratories Ltd.
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OHKUBO Satoshi
Fujitsu Laboratories Ltd.
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Sugita Yutaka
Research Institute Of Electrical Communication Tohoku University
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NAKANISHI Toshiro
FUJITSU LABORATOIRES Ltd.
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Sugita Y
Department Of Physics Toyama University
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TAKASAKI Kanetake
Fujitsu Laboratories Ltd.
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Takasaki Kanetake
Fujitsu Laboratories Limited
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