Novel Interface Structures between Ultrathin Oxynitride and Si(001) Studied by X-Ray Diffraction
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-12-15
著者
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Inoue Kouji
Advanced Research Center Of Science Faculty Of Science And Technology Kwansei Gakuin University (arc
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Komiya Satoshi
Spring-8/jasri
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TERAUCHI Hikaru
Advanced Research Center of Science, School of Science and Technology, Kwansei Gakuin University
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AWAJI Naoki
Fujitsu Laboratories Ltd.
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Terauchi Hikaru
Advanced Research Center Of Science Faculty Of Science And Technology Kwansei Gakuin University (arc
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Doi Syuichi
Fujitsu Laboratories Ltd.
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Nomura Kenji
Fujitsu Laboratories Ltd.
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TAKAHASHI Isao
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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KADA Tositeru
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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KITAHARA Amane
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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SHIMAZU Hiromitsu
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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TANAKA Norihisa
Advanced Research Center of Science, Faculty of Science and Technology, Kwansei Gakuin University
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KOMIYA Satoshi
Materials Science Division, Japan Synchrotron Radiation Research Institute (JASRI, Spring-8)
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