Nanometer-Scale Local Oxidation of Si Using SiN Islands Formed in the Early Stages of Nitridation

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概要

• 論文の詳細を見る
• 1996-08-26

著者

• TABE Michiharu

  Research Institute of Electronics, Shizuoka University

• Tabe Michiharu

  Research Institue Of Electronics Shizuoka University

• YAMAMOTO Takeshi

  Research Institute of Electronics, Shizuoka University

• Yamamoto Takeshi

  Research Institute For Sustainable Humanosphere Kyoto University

• Yamamoto Takeshi

  Research Institute Of Electronics Shizuoka University

関連論文

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• Fowler-Nordheim Current Oscillations in Si(111)/SiO_2/Twisted-Si(111) Tunneling Structures
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• Photoinduced Effects on Single-Charge Tunneling in a Si Two-Dimensional Multidot Field-Effect Transistor
• Artificial Dislocation Network in Silicon-on-Insulator Layer for Single-Electron Devices
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