Damage in ZnO Film Preparation by Planar Magnetron Sputtering System with Obliquely Facing Targets of Zn
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-06-15
著者
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IMAI Hiroshi
Faculty of Science, Kagoshima University
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Tominaga Koji
Atr Optical And Radio Communications Research Laboratories
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Tominaga Koji
Atr Optical And Radio Communications Research Laboratories:(present Address) Sanyo Electric Co. Ltd.
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Tominaga Koji
Department Of Industrial Chemistry Faculty Of Engineering Chubu University
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Tominaga Koji
Semiconductor Research Center Sanyo Electric Co. Ltd.
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Shintani Yoshihiro
Department Of Electrical And Electronic Engineering Tokushima University
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Yoshimi S
Tokushima Univ. Tokushima
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TOMINAGA Kikuo
Faculty of Engineering, The University of Tokushima
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Imai H
Keio Univ. Yokohama Jpn
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Tominaga K
Kobe Univ. Kobe Jpn
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Tominaga Kikuo
Faculty Of Engineering The University Of Tokushima
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SUEYOSHI Yasuhiko
Department of Electrical and Electronic Engineering, The University of Tokushima
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SUEYOSHI Yasuhiko
Faculty of Engineering, The University of Tokushima
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SHIRAI Masaki
Faculty of Engineering, The University of Tokushima
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Shirai Masaki
Faculty Of Engineering The University Of Tokushima
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Shintani Y
Department Of Electrical And Electronic Engineering Tokushima University
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Imai H
Graduate School Of Information Science And Technology The Univeristy Of Tokyo
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Imai Hiroshi
Faculty Of Science University Of Tokyo
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Sueyoshi Yasuhiko
Department Of Electrical And Electronic Engineering The University Of Tokushima
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