High-Energy Oxygen Atoms in ZnO Film Preparation by Reactive Sputtering of Zn : T: Thin Film
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1985-12-25
著者
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Yuasa Takayuki
Faculty of Agriculture, Kochi University
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Tominaga Koji
Semiconductor Research Center Sanyo Electric Co. Ltd.
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Yuasa T
Advanced Technology Research Laboratories Sharp Corporation
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Yuasa Takayuki
Faculty Of Engineering The University Of Tokushima
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Yuasa Takayuki
Faculty Of Agriculture Kochi University
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Yuasa T
Researches And Environment Protection Research Laboratories Nec Corporation
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TADA Osamu
Faculty of Engineering, Tokushima University
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TOMINAGA Kikuo
Faculty of Engineering, The University of Tokushima
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Kume Motoyuki
Department Of Electrical And Electronic Engineering Gifu University
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KUME Michiya
Faculty of Engineering, the University of Tokusima
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Tada O
Faculty Of Engineering The University Of Tokushima
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Tada Osamu
Faculty Of Engineering Tokushima University
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Tada Osamu
Department Of Biology Tokyo University Of Science
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Kume M
Department Of Electrical And Electronic Engineering Gifu University
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Tominaga Kikuo
Faculty Of Engineering The University Of Tokushima
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