Energy Analysis of High-Energy Neutral Atoms in the Sputtering of ZnO and BaTiO_3

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1982-05-20

著者

• TADA Osamu

  Faculty of Engineering, Tokushima University

• SHINTANI Yoshihiro

  Faculty of Engineering, Tokushima University

• Shintani Yoshihiro

  Faculty Of Engineering The University Of Tokushima

• TOMINAGA Kikuo

  Faculty of Engineering, The University of Tokushima

• Tada Osamu

  Faculty Of Engineering Tokushima University

• Tominaga Kikuo

  Faculty Of Engineering Tokushima University

• Tominaga Kikuo

  Faculty Of Engineering The University Of Tokushima

• IWAMURA Satoshi

  Faculty of Engineering, Tokushima University

• Iwamura Satoshi

  Faculty Of Engineering Tokushima University

関連論文

• On the Anomally of Resistance in Reduced BaTiO_3 Crystal
• Film Degradation in AlN Preparation by Facing Target System ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
• Energetic Oxygen Atoms in RF Sputtering of ZnO : T: Thin Film
• High-Energy Oxygen Atoms in ZnO Film Preparation by Reactive Sputtering of Zn : T: Thin Film
• Influence of Energetic Oxygen Bombardment on Conductive ZnO Films
• Energy Distribution of Energetic Oxygen Atoms in the Sputtering of ZnO
• Mean Free Path of Energetic Oxygen Atoms in the Sputtering of ZnO
• High-Energy Particles in AIN Film Preparation by Reactive Sputtering Technique
• Influence of Bombardment by Energetic Atoms on c-Axis Orientation of ZnO Films
• Energy Analysis of High-Energy Neutral Atoms in the Sputtering of ZnO and BaTiO_3
• High-Energy Neutral Atoms in the Sputtering of ZnO
• AIN Film Preparation on Glass by Sputtering System with Facing Targets : T: THIN FILM
• Influence of Energetic Particles on ZnO Films in the Preparation by Planar Magnetron Sputtering with Obliquely Facing Targets
• Damage in ZnO Film Preparation by Planar Magnetron Sputtering System with Obliquely Facing Targets of Zn
• AlN Sputtered Film Properties Prepared at Low Gas Pressures by Facing Target System
• Pb(Zr・Ti)O_3 Films by RF Sputtering in PbO Vapour
• Time-of-Flight Measurement of Particles in SiO_2 Sputtering
• Behaviours of High-Energy Electrons and Neutral Atoms in the Sputtering of BaTiO_3
• Growth of BaTiO_3 Crystals by Floating Zone Technique
• Influence of Target Shape on Properties of AlN Sputtered Film
• Gas Pressure Dependence of AIN Film Properties in Alternating Sputtering System
• Effect of Plasma Protection Net on Crystal Orientation and Residual Stress in Sputtered Gallium Nitride Films(Materials Evaluation by X-ray and Neutron Diffractions)
• The Photovoltaic Polarity of Ge Films Obliquely Deposited in Vacuum
• Radiation Effect due to Energetic Oxygen Atoms on Conductive Al-Doped ZnO Films : Surfaces, Interfaces and Films
• The Mechanism of Photovoltaic Effect of Ge Film Obliquely Deposited in Vacuum
• The Effect of Short-Wavelength Light in Ge Film Obliquely Deposited in Vacuum
• The Photovoltaic Effect of Ge Films at Low Temperatures
• Synergy Effect of Particle Radiation and Ultraviolet Radiation from Capacitively Coupled Radio Frequency Argon Plasmas on n-GaN Etching Damage
• The Photovoltaic Polarity of Ge Films Obliquely Deposited in Vacuum

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