Film Degradation in AlN Preparation by Facing Target System (<Special Issue> FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-09-30
著者
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SHINTANI Yoshihiro
Faculty of Engineering, Tokushima University
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Shintani Yoshihiro
Faculty Of Engineering The University Of Tokushima
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TOMINAGA Kikuo
Faculty of Engineering, The University of Tokushima
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KUSAKA Kazuya
Faculty of Engineering, The University of Tokushima
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CHONG Mufei
Faculty of Engineering, The University of Tokushima
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HANABUSA Takao
Faculty of Engineering, The University of Tokushima
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Chong Mufei
Faculty Of Engineering The University Of Tokushima
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Kusaka Kazuya
Department Of Mechanical Engineering Tokushima University
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Hanabusa T
Department Of Mechanical Engineering Tokushima University
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Hanabusa Takao
Faculty Of Engineering Tokushima University
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Tominaga Kikuo
Dept. Of Electrical And Electronic Engineering Tokushima Univ.
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Tominaga Kikuo
Faculty Of Engineering The University Of Tokushima
関連論文
- On the Anomally of Resistance in Reduced BaTiO_3 Crystal
- Film Degradation in AlN Preparation by Facing Target System ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Energetic Oxygen Atoms in RF Sputtering of ZnO : T: Thin Film
- High-Energy Oxygen Atoms in ZnO Film Preparation by Reactive Sputtering of Zn : T: Thin Film
- Influence of Energetic Oxygen Bombardment on Conductive ZnO Films
- Energy Distribution of Energetic Oxygen Atoms in the Sputtering of ZnO
- Mean Free Path of Energetic Oxygen Atoms in the Sputtering of ZnO
- X-RAY MEASUREMENT OF STRESSES IN DEPOSITED THIN FILM WITH FIBER TEXTURE
- High-Energy Particles in AIN Film Preparation by Reactive Sputtering Technique
- Influence of Bombardment by Energetic Atoms on c-Axis Orientation of ZnO Films
- Energy Analysis of High-Energy Neutral Atoms in the Sputtering of ZnO and BaTiO_3
- High-Energy Neutral Atoms in the Sputtering of ZnO
- AIN Film Preparation on Glass by Sputtering System with Facing Targets : T: THIN FILM
- Influence of Energetic Particles on ZnO Films in the Preparation by Planar Magnetron Sputtering with Obliquely Facing Targets
- Damage in ZnO Film Preparation by Planar Magnetron Sputtering System with Obliquely Facing Targets of Zn
- AlN Sputtered Film Properties Prepared at Low Gas Pressures by Facing Target System
- Time-of-Flight Measurement of Particles in SiO_2 Sputtering
- Evaluation of Internal Stresses in Single-, Double- and Multi-Layered TiN and TiAIN Thin Films by Synchrotron Radiation(Advanced Technology of Experimental Mechanics)
- OS4(P)-16(OS04W0240) Measurement of Residual Stress in Nano-Size Copper Thin Films by Synchrotron Radiation
- OS4(P)-13(OS04W0205) Evaluation of Residual Stress in TiN Thin Films Deposited by Arc-Ion-Plating with Synchrotron Radiation
- OS4(5)-22(OS04W0203) Evaluation of Internal Stresses in Single-, Double- and Multi-Layered TiN and TiAlN Thin Films by Synchrotron Radiation
- X-Ray Stress Measurement and Mechanical Properties of TiN Films Coated on Aluminum and Aluminum Alloy Substrates by Arc Ion Plating and Ion Beam Mixing
- Growth of BaTiO_3 Crystals by Floating Zone Technique
- Influence of Target Shape on Properties of AlN Sputtered Film
- OS4(P)-18(OS04W0258) Residual Stress Measurement of the Quenching Material by the Neutron Diffraction
- OS4(P)-12(OS04W0170) Residual Stress Measurement of Fiber Reinforced Metal Composite by Neutron and X-Ray Diffraction
- OS4(4)-18(OS04W0210) X-Ray and Neutron Diffraction Measurements of Residual Stresses in Cr, CrN and CrN on Cr Interlayer Films Deposited by Arc-Ion-Plating
- Gas Pressure Dependence of AIN Film Properties in Alternating Sputtering System
- OS4(P)-15(OS04W0237) Residual Stress of Cu/TiN Films Deposited by Ion Plating and RF Sputtering
- OS4(P)-14(OS04W0209) Characteristic Evaluation of ZrO_2 Film Deposited by DC Magnetron Sputtering
- OS4(1)-2(OS04W0204) Effect of Powder Target on Crystal Orientation and Residual Stress in Sputtered GaN Film
- Effect of Plasma Protection Net on Crystal Orientation and Residual Stress in Sputtered Gallium Nitride Films(Materials Evaluation by X-ray and Neutron Diffractions)
- Radiation Effect due to Energetic Oxygen Atoms on Conductive Al-Doped ZnO Films : Surfaces, Interfaces and Films
- Special Issue on Materials Evaluation by X-ray and Neutron Diffractions(Materials Evaluation by X-ray and Neutron Diffractions)
- CHANGE IN RESIDUAL STRESSES OF TiN FILMS DUE TO ANNEALING TREATMENTS
- Residual Stress and In-situ Thermal Stress Measurements of Copper Films on Glass Substrate
- Synergy Effect of Particle Radiation and Ultraviolet Radiation from Capacitively Coupled Radio Frequency Argon Plasmas on n-GaN Etching Damage