OS4(1)-2(OS04W0204) Effect of Powder Target on Crystal Orientation and Residual Stress in Sputtered GaN Film
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概要
- 論文の詳細を見る
- 一般社団法人日本機械学会の論文
- 2003-09-09
著者
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Kusaka Kazuya
Department Of Mechanical Engineering Tokushima University
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Hanabusa T
Department Of Mechanical Engineering Tokushima University
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Tominaga Kikuo
Dept. Of Electrical And Electronic Engineering Tokushima Univ.
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Kusaka Kazuya
Dept. of Mechanical Engineering, Tokushima Univ.
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Hanabusa Takao
Dept. of Mechanical Engineering, Tokushima Univ.
関連論文
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- OS4(5)-22(OS04W0203) Evaluation of Internal Stresses in Single-, Double- and Multi-Layered TiN and TiAlN Thin Films by Synchrotron Radiation
- X-Ray Stress Measurement and Mechanical Properties of TiN Films Coated on Aluminum and Aluminum Alloy Substrates by Arc Ion Plating and Ion Beam Mixing
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- OS4(P)-14(OS04W0209) Characteristic Evaluation of ZrO_2 Film Deposited by DC Magnetron Sputtering
- OS4(1)-2(OS04W0204) Effect of Powder Target on Crystal Orientation and Residual Stress in Sputtered GaN Film
- Effect of Plasma Protection Net on Crystal Orientation and Residual Stress in Sputtered Gallium Nitride Films(Materials Evaluation by X-ray and Neutron Diffractions)
- Special Issue on Materials Evaluation by X-ray and Neutron Diffractions(Materials Evaluation by X-ray and Neutron Diffractions)
- CHANGE IN RESIDUAL STRESSES OF TiN FILMS DUE TO ANNEALING TREATMENTS
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