OS4(P)-16(OS04W0240) Measurement of Residual Stress in Nano-Size Copper Thin Films by Synchrotron Radiation

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概要

• 論文の詳細を見る
• 一般社団法人日本機械学会の論文
• 2003-09-09

著者

• Sakata Osami

  Experimental Facilities Division Japan Synchrotron Radiation Research Institute

• Sakata Osami

  Japan Synchrotron Research Institute

• Sakata Osami

  Japan Synchrotron Radiation Research Institute (jasri)

• Sakata Osami

  Japna Synchrotron Radiation Research Institute

• Sakata Osami

  Spring-8

• Kusaka Kazuya

  Department Of Mechanical Engineering Tokushima University

• Hanabusa T

  Department Of Mechanical Engineering Tokushima University

• Tominaga Kikuo

  Dept. Of Electrical And Electronic Engineering Tokushima Univ.

• MATSUE Tatsuya

  Department of Material Engineering, Niihama National College of Technology

• Hataya Mitsuhiko

  Tokushima Univ.

• Kusaka Kazuya

  Dept. of Mechanical Engineering, Tokushima Univ.

• Hanabusa Takao

  Dept. of Mechanical Engineering, Tokushima Univ.

• Matsue Tatsuya

  Dept. of Material Engineering, Niihama National Collage of Tech.

• Matsue Tatsuya

  Department Of Material Engineering Niihama National College Of Technology

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• Molecular Aggregation Structure of Poly(fluoroalkyl acrylate) Thin Films Evaluated by Synchrotron-sourced Grazing-incidence X-ray Diffraction
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