X-RAY MEASUREMENT OF STRESSES IN DEPOSITED THIN FILM WITH FIBER TEXTURE

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概要

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• Thin film coating by physical vapor deposition(PVD)and chemical vapor deposition(CVD)techniques are advancing intensively in the technology of mechanical as well as electrical fields. Deposition by these techniques essentially develops residual stresses in the film for intrinsic and extrinsic reasons. The microstructure of the film normally exhibits a strong preferred orientation on a crystallographic scale. Residual stresses and the microstructure of the growing film influence the properties of the film as well as the film/substrate system. The present paper demonstrates the recent developments in X-ray stress evaluation of the film having a very sharp preferred orientation. A new method of X-ray stress measurement for such films having a strong texture is presented in place of the conventional sin^2ψ method. C-axis oriented aluminum nitride(AIN)films, [111]fiber textured aluminum and titanium nitride(TiN)films and[110]fiber textured TiN films are investigated to study the residual stress and the effect of heat treatment on the state of residual stress. The effects of patterning the film on residual stress are also investigated.

• 1999-06-15

著者

• Hanabusa Takao

  Faculty Of Engineering Tokushima University

関連論文

• Film Degradation in AlN Preparation by Facing Target System ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
• X-RAY MEASUREMENT OF STRESSES IN DEPOSITED THIN FILM WITH FIBER TEXTURE
• Influence of Target Shape on Properties of AlN Sputtered Film
• Gas Pressure Dependence of AIN Film Properties in Alternating Sputtering System
• Effect of Plasma Protection Net on Crystal Orientation and Residual Stress in Sputtered Gallium Nitride Films(Materials Evaluation by X-ray and Neutron Diffractions)
• CHANGE IN RESIDUAL STRESSES OF TiN FILMS DUE TO ANNEALING TREATMENTS
• Residual Stress and In-situ Thermal Stress Measurements of Copper Films on Glass Substrate

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