Reduction Imaging at 4.5 nm with Schwarzschild Optics
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-08-15
著者
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YAMASHITA Yoshio
SORTEC Corporation
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Oizumi H
Hitachi Ltd. Tokyo Jpn
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Oizumi H
Aset Euvl Lab. Kanagawa Jpn
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Oizumi Hiroaki
Sortec Corporation
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Atoda Nobufumi
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
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Atoda N
Sortec Ibaraki Jpn
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Atoda Nobufumi
Sortec
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Murakami K
静岡大学電子工学研究所
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Nagata H
Sumitomo Osaka Cement Co. Ltd. Chiba Jpn
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MURAKAMI Katsuhiko
Main Research Laboratory, Nikon Corporation
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OHTANI Masayuki
Tsukuba Research Laboratory, Nikon Corporation
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NAGATA Hiroshi
Main Research Laboratory, Nikon Corporation
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Nagata Hiroshi
Main Research Laboratory Nikon Corporation
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Yamaguchi Yoh-ichi
Hoya Corporation
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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Murakami Kouichi
Institute Of Material Science University Of Tsukuba
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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Ohtani M
Obihiro Univ. Agriculture And Veterinary Medicine Obihiro Jpn
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Murakami K
Research Institute Of Electronics Shizuoka University
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Ohtani Masayuki
Tsukuba Research Laboratory Nikon Corporation
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