High-Speed Optical Near-Field Photolithography by Super Resolution Near-Field Structure
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-09-15
著者
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TOMINAGA Junji
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
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NAKANO Takashi
Advanced Optical Memory Group, National Institute for Advenced Interdisciplinary Research (NAIR)
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ATODA Nobufumi
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
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Tominaga J
Center For Applied Near-field Optics Research (can-for) Aist
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Tominaga J
Chikumagawa The 1st Technical Center Tdk
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Tominaga Junji
Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research
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Atoda Nobufumi
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
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Atoda N
Sortec Ibaraki Jpn
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Atoda Nobufumi
Sortec
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Atoda Nobufumi
Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research
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Atoda N.
National Institute for Advanced Interdisciplinary Research (NAIR) Advanced Optical Memory Group
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Kuwahara M
Center For Applied Near-field Optics Research (can-for) Aist
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KUWAHARA Masashi
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
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LEE Myung
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
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Atoda N
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
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Lee M
Samsung Advanced Inst. Of Technol. (sait) Kyungki‐do Kor
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Kuwahara Masashi
Advanced Industrial Science & Technology Crest
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Nakano T
Center For Applied Near-field Optics Research (can-for) National Institute Of Advanced Industrial Sc
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Lee Myung
Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research (nair)
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Nakano Takashi
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR), 1-1-4 Higashi, Tsukuba 305-8562, Japan
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Nakano Takashi
Advanced Optical Memory Group, NAIR, MITI
関連論文
- Observation of Eye Pattern on Super-Resolution Near-Field Structure Disk with Write-Strategy Technique
- Super-Resolution Read-Only Memory Disk with Metal Nanoparticles or Small Aperture
- Super-Resolution Near-Field Structure and Signal Enhancement by Surface Plasmons
- In-situ Raman Scattering Spectroscopy for a Super Resolution Optical Disk during Readout
- Electroplated Reflection Masks for Soft X-Ray Projection Lithography
- Resist Performance in 5 nm Soft X-Ray Projection Lithography
- Reduction Imaging at 4.5 nm with Schwarzschild Optics
- Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
- Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
- Optical Properties of Metal-Oxide Films in Super-RENS
- Super-Resolutional Readout Disk with Metal-Free Phthalocyanine Recording Layer
- Spectroscopic Investigation of AgO_x Films for Super Resolution Near Field Structure Application
- Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers
- The Near-Field Super-Resolution Properties of an Antimony Thin Film
- Thermal Lithography for 100-nm Dimensions Using a Nano-Heat Spot of a Visible Laser Beam : Instrumentation, Measurement, and Fabrication Technology
- Readout Durability Improvement of Super-Resolution Near-Field Structure Discs with PtO_x-SiO_2 Recording and GeN_y Interfacial Layers
- Analysis of Deformation of X-Ray Mask Membrane in Aligner Motion
- Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure
- In-Ag-Te-Sb Phase Change Recording Media at Compact Disk Linear Velocity
- V and Ti Doping Effect on In-Ag-Te-Sb Optical Phase Change Rewritable Disc
- New Recordable Compact Disc with Inorganic Material, AgO_x
- Thermal Origin of Readout Mechanism of Light-Scattering Super-Resolution Near-Field Structure Disk
- High-Speed Optical Near-Field Photolithography by Super Resolution Near-Field Structure
- Fundamental Study in Extracorporeal Shock Wave Lithotripsy Using Piezoceramics : High Power Ultrasonics
- Improvement of Super-RENS MO Disk Characteristics by Optimized Super-Resolution Near-Field Structure
- Super-Resolution Readout Using a Silver Scattering Center with Plasmon Excitation Generated in a Non-Magnetic Readout Layer
- Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure
- The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS)
- Near-Field Optical Simulation of Super-Resolution Near-Field Structure Disks
- Oxygen Doping Effects on Super-resolution Scattering-mode Near-field Optical Data Storage
- A Near-Field Recording and Readout Technology Using a Metallic Probe in an Optical Disk
- The Characteristics and the Potential of Super Resolution Near-Field Structure
- Double Optical Phase Transition of GeSbTe Thin Films Sandwiched between Two SiN Layers
- Effect of SiO2 addition to PtOx recording layer of super-resolution near-field structure disc (Special issue: Optical memories)
- Metal-Free Phthalocyanine Layer Prepared on Read-Only-Memory Disc for Super-Resolution Readout
- Super-RENS Disk for Blue Laser System Retrieving Signals from Polycarbonate Substrate Side
- Readout Power Dependence of Signal Distribution Observed in Fourier Plane of Focus Spot
- An Approach to Lower the Threshold Laser Power of Super-Resolutional-Readout Optical Disk Using Silver Telluride Layer
- Scanning Tunneling Microscopy Image of GeSb_2Te_4 Thin Films
- Electrical Properties of Nanometer-Width Refractory Metal Lines Fabricated by Focused Ion Beam and Oxide Resists
- 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists : Focused Ion Beam Process
- 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists
- Nanoscale Dots Fabrication by Volume Change Thermal Lithography
- Signal Characteristics of Super-Resolution Near-Field Structure Disks with 100GB Capacity
- Super Resolution Read Only Memory Disc Using Super-Resolution Near-Field Structure Technology
- Signal Characteristics of Super-Resolution Near-Field Structure Disk in Blue Laser System
- Mechanism of Resist Pattern Collapse during Development Process
- Dual Function of Thin MoO_3 and WO_3 Films as Negative and Positive Resists for Focused Ion Beam Lithography
- Study of the Crystallization of GeSbTe Films by Raman Spectroscopy
- Single-Electron Transistor with Ultra-High Coulomb Energy of 5000K Using Position Controlled Grown Carbon Nanotube as Channel
- Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology
- Super-Resolution Near-Field Structure and Signal Enhancement by Surface Plasmons
- Near-Field Optical Simulation of Super-Resolution Near-Field Structure Disks
- Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure
- The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS)
- Single-Electron Transistor with Ultra-High Coulomb Energy of 5000 K Using Position Controlled Grown Carbon Nanotube as Channel
- Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers