Single-Electron Transistor with Ultra-High Coulomb Energy of 5000 K Using Position Controlled Grown Carbon Nanotube as Channel
スポンサーリンク
概要
- 論文の詳細を見る
Using the patterned chemical catalyst, the position of the carbon nanotube was successfully controlled. Using this carbon nanotube as a channel, the single electron transistor was fabricated. The defects in the carbon nanotube formed spontaneously quantum dots with the size of ${\sim}1$ nm. The single electron transistor showed the room-temperature Coulomb diamond characteristics with an ultra-high Coulomb energy of 5000 K.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-04-15
著者
-
Awano Yuji
Fujitsu Lab. Ltd. Kanagawa Jpn
-
Kinoshita Seizo
Advanced Industrial Science & Technology Crest
-
GOTOH Yoshitaka
Advanced Industrial Science & Technology, CREST
-
KURACHI Kousuke
Advanced Industrial Science & Technology, CREST
-
KAMIMURA Takahumi
Advanced Industrial Science & Technology, CREST
-
MAEDA Masatoshi
Advanced Industrial Science & Technology, CREST
-
SAKAMOTO Kazue
Advanced Industrial Science & Technology, CREST
-
ATODA Nobuhumi
Advanced Industrial Science & Technology, CREST
-
Kuwahara Masashi
Advanced Industrial Science & Technology Crest
-
Matsumoto Kazuhiko
Advanced Industrial Science & Technology, CREST
-
Kamimura Takahumi
Advanced Industrial Science & Technology, CREST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Kurachi Kousuke
Advanced Industrial Science & Technology, CREST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Maeda Masatoshi
Advanced Industrial Science & Technology, CREST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Kuwahara Masashi
Advanced Industrial Science & Technology, CREST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
-
Gotoh Yoshitaka
Advanced Industrial Science & Technology, CREST, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
関連論文
- Phonon Assisted Tunneling and P/V-Ratio in a Magnetic Confined Quasi 0D InGaAs/InAlAs Resonant Tunneling Diode
- InAs Self-Assembled Quantum Dots Coupled with GaSb Monolayer Quantum Well
- Narrow Photoluminescemce Line Width of Closely Stacked InAs Self-Assembled Quantum Dot Structures
- Phonon Assisted Tunneling and Peak-to-Valley Ratio in a Magnetically Confined Quasi Zero Dimensional InGaAs/InAlAs Resonant Tunneling Diode
- InGaAs/GaAs Tetrahedral-Shaped Recess Quantum Dot (TSR-QD)Technology (Special Issue on Quantum Effect Devices and Their Fabrication Technologies)
- Chemical Modification of Multi-walled Carbon Nanotubes (MWNTs) By Vacuum Ultraviolet (VUV) Irradiation Dry Process
- Influence of Growth Mode of Carbon Nanotubes on Physical Properties for Multiwalled Carbon Nanotube Films Grown by Catalystic Chemical Vapor Deposition
- Carbon nanotube technologies for future ULSI via interconnects
- Room Temperature Coulomb Diamond Characteristic of Single Electron Transistor Made by AFM Nano-Oxidation Process
- High-Speed Optical Near-Field Photolithography by Super Resolution Near-Field Structure
- 0.1μm-Gate InGaP/InGaAs HEMT Technology for Millimeter Wave Applications(Special Issue on Microwave and Millimeter-Wave Module Technology)
- Monte Carlo Simulations of Electron Transport in In0.52Al0.48As/In0.75Ga0.25As High Electron Mobility Transistors at 300 and 16 K
- Emission Properties from Carbon Nanotube Field Emitter Arrays (FEAS) Grown on Si Emitters : Surfaces. Interfaces, and Films
- Chemical Modification of Multiwalled Carbon Nanotubes by Vacuum Ultraviolet Irradiation Dry Process
- Carbon Nanotube Growth Technologies Using Tantalum Barrier Layer for Future ULSIs with Cu/Low-$k$ Interconnect Processes
- Electrical Properties of Carbon Nanotube Bundles for Future Via Interconnects
- First-Principles Study of Electronic Properties in Si Lattice Matched SiGeC Alloy with a Low C Concentration
- Single-Electron Transistor with Ultra-High Coulomb Energy of 5000K Using Position Controlled Grown Carbon Nanotube as Channel
- Effect of Gate–Drain Spacing for In0.52Al0.48As/In0.53Ga0.47As High Electron Mobility Transistors Studied by Monte Carlo Simulations
- Carbon Nanotube Technologies for LSI via Interconnects(Novel Device Architectures and System Integration Technologies)
- Simultaneous Formation of Multiwall Carbon Nanotubes and their End-Bonded Ohmic Contacts to Ti Electrodes for Future ULSI Interconnects
- Mechanical Polishing Technique for Carbon Nanotube Interconnects in ULSIs
- Single-Electron Transistor with Ultra-High Coulomb Energy of 5000 K Using Position Controlled Grown Carbon Nanotube as Channel