Mechanical Polishing Technique for Carbon Nanotube Interconnects in ULSIs
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概要
- 論文の詳細を見る
We examined a mechanical polishing technique for multiwalled carbon nanotube (MWNT) vias. This polishing technique involved the use of diamond particles fixing MWNT protrusions of the samples. The 1-μm-high outthrust MWNTs were polished, and then flat sample surfaces were obtained by controlling polishing pressure and polishing time. A cross-sectional image of a cut MWNT was obtained by high-resolution scanning electron microscopy. Mechanically polished MWNT interconnects with a high current density and a low resistance were developed.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-09-15
著者
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Awano Yuji
Fujitsu Lab. Ltd. Kanagawa Jpn
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HORIBE Masahiro
Fujitsu Limited
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KAWABATA Akio
Fujitsu Limited
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Nihei Mizuhisa
Fujitsu Laboratories Ltd.
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Kondo Daiyu
Fujitsu Laboratories Ltd.
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Nihei Mizuhisa
Fujitsu Limited, 10-1 Wakamiya, Morinosato, Atsugi, Kanagawa 243-0197, Japan
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Awano Yuji
Fujitsu Limited, 10-1 Wakamiya, Morinosato, Atsugi, Kanagawa 243-0197, Japan
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Horibe Masahiro
Fujitsu Limited, 10-1 Wakamiya, Morinosato, Atsugi, Kanagawa 243-0197, Japan
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Kondo Daiyu
Fujitsu Limited, 10-1 Wakamiya, Morinosato, Atsugi, Kanagawa 243-0197, Japan
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Kawabata Akio
Fujitsu Limited, 10-1 Wakamiya, Morinosato, Atsugi, Kanagawa 243-0197, Japan
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