Carbon Nanotube Growth Technologies Using Tantalum Barrier Layer for Future ULSIs with Cu/Low-k Interconnect Processes
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
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AWANO Yuji
Fujitsu Ltd.
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Awano Y
Fujitsu Ltd. Atsugi Jpn
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HORIBE Masahiro
Fujitsu Limited
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NIHEI Mizuhisa
Fujitsu Limited
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KONDO Daiyu
Fujitsu Limited
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KAWABATA Akio
Fujitsu Limited
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Kondo Daiyu
Nanotechnology Research Center Fujitsu Laboratories Ltd.
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Kondo Daiyu
Department Of Physics Graduate School Of Science Tohoku University
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