Direction-Controlled Growth of Carbon Nanotubes

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概要

• 論文の詳細を見る

• We have developed a method of directing or bending carbon nanotubes (CNTs) in the desired direction along a structure. The new method utilizes careful positioning of a catalyst with respect to the structure, so that the CNTs growing from the catalyst experience an effective van der Waals force from the structure. The force causes a CNT-bundle to grow in the desired direction. For instance, a CNT-bundle coming out of a hole can be bent to the right or left depending on the catalyst patterning at the bottom. This approach is promising for achieving three-dimensional CNT wiring for future electronic devices.

• 2008-04-25

著者

• Awano Yuji

  Nanotechnology Research Center Fujitsu Laboratories Ltd.

• KAWABATA Akio

  Nanotechnology Research Center, Fujitsu Laboratories Ltd.

• SATO Shintaro

  Nanotechnology Research Center, Fujitsu Laboratories Ltd.

• Kondo Daiyu

  Nanotechnology Research Center Fujitsu Laboratories Ltd.

• Nihei Mizuhisa

  Nanotechnology Research Center Fujitsu Laboratories Ltd.

• IWAI Taisuke

  Nanotechnology Research Center, Fujitsu Laboratories Ltd.

• Shioya Hiroki

  Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan

• Kondo Daiyu

  Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-wakamiya, Atsugi, Kanagawa 243-0197, Japan

• Kawabata Akio

  Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-wakamiya, Atsugi, Kanagawa 243-0197, Japan

• Iwai Taisuke

  Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan

関連論文

• Evaluation of thermal conductivity of a multi-walled carbon nanotube using the ΔVgs method
• Patterned Carbon Nanotube Films Formed by Surface Decomposition of SiC Wafers
• Chemical Modification of Multiwalled Carbon Nanotubes by Vacuum Ultraviolet Irradiation Dry Process (Special Issue: Solid State Devices & Materials)
• Carbon Nanotube Vias Fabricated by Remote Plasma-Enhanced Chemical Vapor Deposition
• Electrical properties of carbon nanotubes grown at a low temperature by radical chemical vapor deposition for future LSI interconnects
• Carbon Nanotube Via Technologies for Advanced Interconnect Integration
• Chemical Modification of Multi-walled Carbon Nanotubes (MWNTs) By Vacuum Ultraviolet (VUV) Irradiation Dry Process
• Carbon Nanotube Growth Technologies Using Tantalum Barrier Layer for Future ULSIs with Cu/Low-k Interconnect Processes
• Diameter-Controlled Growth of Multi-Walled Carbon Nanotubes by Hot-Filament Chemical Vapor Deposition with Ferritin as a Catalyst on a Silicon Substrate
• Electrical Properties of Carbon Nanotube Bundles for Future Via Interconnects
• Influence of Growth Mode of Carbon Nanotubes on Physical Properties for Multiwalled Carbon Nanotube Films Grown by Catalystic Chemical Vapor Deposition
• Carbon nanotube technologies for future ULSI via interconnects
• Mechanical Polishing Technique for Carbon Nanotube Interconnects in ULSIs
• Direct Diameter-Controlled Growth of Multiwall Carbon Nanotubes on Nickel-Silicide Layer
• The Growth Mechanism of SiC Film on a Si (111)-(7×7) Surface by C_ Precursor Studied by Photoelectron Spectroscopy
• CNT-FETs with High Modulated Drain Current utilizing Size-classified Fe Particles as a Catalyst
• Low-Temperature Synthesis of Graphene and Fabrication of Top-Gated Field Effect Transistors without Using Transfer Processes
• Performance Estimation of Graphene Field-Effect Transistors Using Semiclassical Monte Carlo Simulation
• Synthesis of a Closely Packed Carbon Nanotube Forest by a Multi-Step Growth Method Using Plasma-Based Chemical Vapor Deposition
• High-Quality Carbon Nanotube Growth at Low Temperature by Pulse-Excited Remote Plasma Chemical Vapor Deposition
• Self-organization of Novel Carbon Composite Structure : Graphene Multi-Layers Combined Perpendicularly with Aligned Carbon Nanotubes
• Direction-Controlled Growth of Carbon Nanotubes
• Evaluation of Thermal Conductivity of a Multi-Walled Carbon Nanotube Using the $\Delta V_{\text{gs}}$ Method
• Chemical Modification of Multiwalled Carbon Nanotubes by Vacuum Ultraviolet Irradiation Dry Process
• Patterned Carbon Nanotube Films Formed by Surface Decomposition of SiC Wafers
• Direct Diameter-Controlled Growth of Multiwall Carbon Nanotubes on Nickel-Silicide Layer
• Diameter-Controlled Growth of Multi-Walled Carbon Nanotubes by Hot-Filament Chemical Vapor Deposition with Ferritin as a Catalyst on a Silicon Substrate

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