Nihei Mizuhisa | Nanotechnology Research Center Fujitsu Laboratories Ltd.
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概要
関連著者
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Nihei Mizuhisa
Nanotechnology Research Center Fujitsu Laboratories Ltd.
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Awano Y
Fujitsu Ltd. Atsugi Jpn
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Awano Yuji
Fujitsu Laboratories Ltd.
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Kondo Daiyu
Nanotechnology Research Center Fujitsu Laboratories Ltd.
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Sato Shintaro
Mirai-selete
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Sato Shintaro
Fujitsu Laboratories Ltd.
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Awano Yuji
Nanotechnology Research Center Fujitsu Laboratories Ltd.
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NIHEI Mizuhisa
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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AWANO Yuji
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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Kondo Daiyu
Department Of Physics Graduate School Of Science Tohoku University
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Nihei Mizuhisa
Mirai-selete (semiconductor Leading Edge Technologies Inc.)
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Awano Yuji
Mirai-selete
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Nihei Mizuhisa
MIRAI-Selete
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Nihei Mizuhisa
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Awano Yuji
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Sato Shintaro
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Awano Yuji
Fujitsu Lab. Ltd. Kanagawa Jpn
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KAWABATA Akio
Nanotechnology Research Center, Fujitsu Laboratories Ltd.
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Kawabata Akio
Mirai-selete (semiconductor Leading Edge Technologies Inc.)
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AWANO Yuji
Fujitsu Ltd.
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Sakai Tadashi
Mirai-selete
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Hyakushima Takashi
Mirai-selete (semiconductor Leading Edge Technologies Inc.)
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KATAGIRI Masayuki
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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SAKUMA Naoshi
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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SUZUKI Mariko
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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NIHEI Mizuhisa
Fujitsu Limited
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KONDO Daiyu
Fujitsu Limited
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Suzuki Mariko
Mirai-selete
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Sakuma Naoshi
Mirai-selete
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Nihei Mizuhisa
Fujitsu Laboratories Ltd.
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Kondo Daiyu
Fujitsu Laboratories Ltd.
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Katagiri Masayuki
Mirai-selete
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SAITO Tatsuro
Low-Power Electronics Association and Project (LEAP)
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Sakuma Naoshi
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Suzuki Mariko
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Sakai Tadashi
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Katagiri Masayuki
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Hyakushima Takashi
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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YOKOYAMA Naoki
Fujitsu Laboratories Ltd.
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Fisher Craig
Materials Research And Development Laboratory Japan Fine Ceramics Center
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NIHEI Mizuhisa
Nanotechnology Research Center, Fujitsu Laboratories Ltd.
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Takei Fumio
Fujitsu Laboratories Ltd.
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OHFUTI Mari
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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KAWABATA Akio
Fujitsu Limited
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SATO Shintaro
Fujitsu Limited
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OHFUTI Mari
Fujitsu Limited
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Ohfuti Mari
Mirai-selete (semiconductor Leading Edge Technologies Inc.)
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Iwai Taisuke
Waseda Univ. School Of Sci & Eng.
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Honjo Chizuru
Materials Research And Development Laboratory Japan Fine Ceramics Center
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Yamazaki Yuichi
Mirai-selete
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IWAI Taisuke
Nanotechnology Research Center, Fujitsu Laboratories Ltd.
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Kusunoki Michiko
Materials Research And Development Laboratory Japan Fine Ceramics Center
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Asano Koji
Fujitsu Laboratories Ltd.
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Suzuki Toshiyuki
Materials Research And Development Laboratory Japan Fine Ceramics Center
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Hirayama Tsukasa
Materials R&d Laboratory Japan Fine Ceramics Center
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Shioya Hiroki
Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Yamazaki Yuichi
MIRAI--Selete, 1 Komukai-Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Kawabata Akio
Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-wakamiya, Atsugi, Kanagawa 243-0197, Japan
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KUSUNOKI Michiko
Materials Research and Development Laboratory, Japan Fine Ceramics Center
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SUZUKI Toshiyuki
Materials Research and Development Laboratory, Japan Fine Ceramics Center
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HONJO Chizuru
Materials Research and Development Laboratory, Japan Fine Ceramics Center
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HIRAYAMA Tsukasa
Materials Research and Development Laboratory, Japan Fine Ceramics Center
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YOKOYAMA Daisuke
Waseda Univ., School of Sci & Eng.
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ISHIMARU Kentaro
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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IWASAKI Takayuki
Waseda Univ., School of Sci & Eng.
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KAWARADA Hiroshi
Waseda Univ., School of Sci & Eng.
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KAWABATA Akio
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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NOZUE Tatsuhiro
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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KONDO Daiyu
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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SHIOYA Hiroki
MIRAI-Selete (Semiconductor Leading Edge Technologies, Inc.)
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IWAI Taisuke
Fujitsu Limited
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ASANO Koji
Fujitsu Limited
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KONDO Daiyu
Nanotechnology Research Center, Fujitsu Laboratories Ltd.
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HORIBE Masahiro
Fujitsu Limited
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SATO Shintaro
Nanotechnology Research Center, Fujitsu Laboratories Ltd.
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YOKOYAMA Naoki
Nanotechnology Research Center, Fujitsu Laboratories Ltd.
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Hirayama Tsukasa
Materials Research And Development Laboratory Japan Fine Ceramics Center
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Nozue Tatsuhiro
Mirai-selete (semiconductor Leading Edge Technologies Inc.)
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HARADA Naoki
Fujitsu Laboratories Ltd.
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Iwai Taisuke
Fujitsu Laboratories Ltd.
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Sato Motonobu
Fujitsu Laboratories Ltd.
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YAGI Katsunori
Fujitsu Laboratories Ltd.
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WADA Makoto
Corporate Research and Development Center, Toshiba Corporation
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MATSUNAGA Noriaki
Corporate Research and Development Center, Toshiba Corporation
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Kondo Daiyu
Mirai-selete (semiconductor Leading Edge Technologies Inc.)
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Shioya Hiroki
Mirai-selete (semiconductor Leading Edge Technologies Inc.)
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Ishimaru Kentaro
Mirai-selete (semiconductor Leading Edge Technologies Inc.)
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Matsunaga Noriaki
Corporate Research And Development Center Toshiba Corporation
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Yokoyama Daisuke
Waseda Univ. School Of Sci & Eng.
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Yokoyama Naoki
Nanotechnology Research Center Fujitsu Laboratories Ltd.
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Kawarada Hiroshi
Waseda Univ. School Of Sci & Eng.
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Honjo Chizuru
Materials Research and Development Laboratory, Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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Nihei Mizuhisa
Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Nihei Mizuhisa
Nanotechnology Research Center, Fujitsu Laboratories Ltd., Atsugi, Kanagawa 243-0197, Japan
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Nihei Mizuhisa
Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato, Wakamiya, Atsugi 243-0197, Japan
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Nozue Tatsuhiro
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Awano Yuji
Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Awano Yuji
Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato, Wakamiya, Atsugi 243-0197, Japan
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Takei Fumio
Fujitsu Laboratories Ltd., 10-1 Morinosato-wakamiya, Atsugi, Kanagawa 243-0197, Japan
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HARADA Naoki
Fujitsu Laboratories Limited
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Hirayama Tsukasa
Materials Research and Development Laboratory, Japan Fine Ceramics Center, 2-4-1 Mutsuno, Atsuta-ku, Nagoya 456-8587, Japan
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Kondo Daiyu
Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Kondo Daiyu
Nanotechnology Research Center, Fujitsu Laboratories Ltd., Atsugi, Kanagawa 243-0197, Japan
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Kawabata Akio
MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
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Iwai Taisuke
Nanotechnology Research Center, Fujitsu Laboratories Ltd., Atsugi, Kanagawa 243-0197, Japan
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Iwai Taisuke
Nanotechnology Research Center, Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan
著作論文
- Patterned Carbon Nanotube Films Formed by Surface Decomposition of SiC Wafers
- Carbon Nanotube Vias Fabricated by Remote Plasma-Enhanced Chemical Vapor Deposition
- Electrical properties of carbon nanotubes grown at a low temperature by radical chemical vapor deposition for future LSI interconnects
- Carbon Nanotube Via Technologies for Advanced Interconnect Integration
- Chemical Modification of Multi-walled Carbon Nanotubes (MWNTs) By Vacuum Ultraviolet (VUV) Irradiation Dry Process
- Influence of Growth Mode of Carbon Nanotubes on Physical Properties for Multiwalled Carbon Nanotube Films Grown by Catalystic Chemical Vapor Deposition
- Carbon nanotube technologies for future ULSI via interconnects
- Low-Temperature Synthesis of Graphene and Fabrication of Top-Gated Field Effect Transistors without Using Transfer Processes
- Synthesis of a Closely Packed Carbon Nanotube Forest by a Multi-Step Growth Method Using Plasma-Based Chemical Vapor Deposition
- High-Quality Carbon Nanotube Growth at Low Temperature by Pulse-Excited Remote Plasma Chemical Vapor Deposition
- Direction-Controlled Growth of Carbon Nanotubes
- Evaluation of Thermal Conductivity of a Multi-Walled Carbon Nanotube Using the $\Delta V_{\text{gs}}$ Method
- Chemical Modification of Multiwalled Carbon Nanotubes by Vacuum Ultraviolet Irradiation Dry Process
- Patterned Carbon Nanotube Films Formed by Surface Decomposition of SiC Wafers
- Direct Diameter-Controlled Growth of Multiwall Carbon Nanotubes on Nickel-Silicide Layer