Awano Yuji | MIRAI–Selete (Semiconductor Leading Edge Technologies, Inc.), 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan

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著作論文

Carbon Nanotube Vias Fabricated by Remote Plasma-Enhanced Chemical Vapor Deposition
Electrical properties of carbon nanotubes grown at a low temperature by radical chemical vapor deposition for future LSI interconnects
Carbon Nanotube Via Technologies for Advanced Interconnect Integration
Synthesis of a Closely Packed Carbon Nanotube Forest by a Multi-Step Growth Method Using Plasma-Based Chemical Vapor Deposition
High-Quality Carbon Nanotube Growth at Low Temperature by Pulse-Excited Remote Plasma Chemical Vapor Deposition
High-Current Reliability of Carbon Nanotube Via Interconnects
Low-Temperature Growth of Multiwalled Carbon Nanotubes by Surface-Wave Plasma-Enhanced Chemical Vapor Deposition Using Catalyst Nanoparticles
Carbon Nanotube Vias Fabricated by Remote Plasma-Enhanced Chemical Vapor Deposition
Electrical Properties of Carbon Nanotubes Grown at a Low Temperature for Use as Interconnects
Improvement in Electrical Properties of Carbon Nanotube Via Interconnects

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