Oxygen Doping Effects on Super-resolution Scattering-mode Near-field Optical Data Storage

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2000-05-15

著者

• FUJI Hiroshi

  Advanced Technology Research Laboratories, Sharp Corporation

• TOMINAGA Junji

  Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)

• MEN Liqiu

  Advanced Optical Memory Group, National Institute for Advanced Inerdisciplinary Research (NAIR)

• ATODA Nobufumi

  Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)

• Men Liqiu

  Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research (nair)

• Fuji H

  Sharp Corp. Nara Jpn

• Fuji Hiroshi

  Advanced Technology Research Laboratories Sharp Corporation

• Tominaga J

  Center For Applied Near-field Optics Research (can-for) Aist

• Tominaga J

  Chikumagawa The 1st Technical Center Tdk

• Tominaga Junji

  Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research

• Atoda Nobufumi

  Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec

• Atoda N

  Sortec Ibaraki Jpn

• Atoda Nobufumi

  Sortec

• Atoda Nobufumi

  Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research

• Atoda N.

  National Institute for Advanced Interdisciplinary Research (NAIR) Advanced Optical Memory Group

• Atoda N

  Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec

• Men Liqiu

  Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research

• Fuji Hiroshi

  Advanced Technology Research Laboratories Sharp Corp.

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• Electroplated Reflection Masks for Soft X-Ray Projection Lithography
• Resist Performance in 5 nm Soft X-Ray Projection Lithography
• Reduction Imaging at 4.5 nm with Schwarzschild Optics
• Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
• Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
• High Density Recording Capability of Laser-Assisted Magnetic Recording
• Optical Properties of Metal-Oxide Films in Super-RENS
• Super-Resolutional Readout Disk with Metal-Free Phthalocyanine Recording Layer
• Spectroscopic Investigation of AgO_x Films for Super Resolution Near Field Structure Application
• Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers
• The Near-Field Super-Resolution Properties of an Antimony Thin Film
• Thermal Lithography for 100-nm Dimensions Using a Nano-Heat Spot of a Visible Laser Beam : Instrumentation, Measurement, and Fabrication Technology
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• 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists : Focused Ion Beam Process
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• Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry
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• Nanoscale Dots Fabrication by Volume Change Thermal Lithography
• Signal Characteristics of Super-Resolution Near-Field Structure Disks with 100GB Capacity
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• Signal Characteristics of Super-Resolution Near-Field Structure Disk in Blue Laser System
• Mechanism of Resist Pattern Collapse during Development Process
• Dual Function of Thin MoO_3 and WO_3 Films as Negative and Positive Resists for Focused Ion Beam Lithography
• Study of the Crystallization of GeSbTe Films by Raman Spectroscopy
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• Bit-by-Bit Detection on Super-Resolution Near-Field Structure Disk with Platinum Oxide Layer
• Super-Resolution Near-Field Structure and Signal Enhancement by Surface Plasmons
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• Near-Field Optical Simulation of Super-Resolution Near-Field Structure Disks
• Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure
• The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS)
• Recording and Readout Mechanisms of Super-Resolution Near-Field Structure Disc with Silver-Oxide Layer
• Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers

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