Resist Performance in 5 nm Soft X-Ray Projection Lithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-12-30

著者

• YAMASHITA Yoshio

  SORTEC Corporation

• Oizumi H

  Hitachi Ltd. Tokyo Jpn

• Oizumi H

  Aset Euvl Lab. Kanagawa Jpn

• Oizumi Hiroaki

  Sortec Corporation

• Atoda Nobufumi

  Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec

• Atoda N

  Sortec Ibaraki Jpn

• Atoda Nobufumi

  Sortec

• Murakami K

  静岡大学電子工学研究所

• Nagata H

  Sumitomo Osaka Cement Co. Ltd. Chiba Jpn

• OHTANI Masayuki

  Tsukuba Research Laboratory, Nikon Corporation

• MURAKAMI Katsuhiko

  Tsukuba Research Laboratory, Nikon Corporation

• NAGATA Hiroshi

  Tsukuba Research Laboratory, Nikon Corporation

• Yamashita Yohachi

  Corporate R&d Center Toshiba Corporation

• Yamashita Yohachi

  Toshiba Materials & Devices Research Laboratories

• Yamaguchi Yoh-ichi

  Hoya Corporation

• Yamashita Yoshio

  Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.

• Murakami Kouichi

  Institute Of Material Science University Of Tsukuba

• Yamashita Y

  Central Research Laboratory Hamamatsu Photonics K.k.

• Ohtani M

  Obihiro Univ. Agriculture And Veterinary Medicine Obihiro Jpn

• Murakami K

  Research Institute Of Electronics Shizuoka University

• Ohtani Masayuki

  Tsukuba Research Laboratory Nikon Corporation

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