Improvement in Radiation Stability of SiN X-Ray Mask Membranes

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1993-12-30

著者

• YAMASHITA Yoshio

  SORTEC Corporation

• Noda S

  Assoc. Super‐advanced Electronics Technol. (aset) Yokohama Jpn

• Noda Shoji

  Toyota Central Research And Development Labs

• Kumar R

  Denso Corp. Aichi Jpn

• Kumar Rakesh

  Chemical Branch Archaeological Survey Of India Kedar Gouri Road

• Ohta Takayuki

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Yamashita Yohachi

  Toshiba Materials & Devices Research Laboratories

• Noda S

  Assoc. Super‐advanced Electronics Technol. Kanagawa Jpn

• Yamaguchi Yoh-ichi

  Hoya Corporation

• HOGA Hiroshi

  Toppan Printing Co., Lid.

• HOGA Hiroshi

  Oki Electric Industry Co., Ltd.

• Hoga Hiroshi

  Oki Electric Industry Co. Ltd.

• Ohta Tsuneaki

  Optoelectronics Joint Research Laboratory

• Ohta Tuneaki

  Oki Electric Industry Co. Ltd.

• Ohta Tsuneaki

  Oki Ekectric Industry Co. Ltd.

• Ohta Tsuneaki

  Oki Electric Industry Co. Ltd.

• Noda Shuichi

  Association Of Super-advanced Electronics Technologies (aset):(present Address)vlsi R&d Center O

• Noda Syuichi

  Oki Electric Industry Co. Ltd.

• Yamashita Yoshio

  Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.

• Ohta T

  Matsushita Electric Industrial Co. Ltd. Osaka Jpn

• ARAKAWA Tomiyuki

  SORTEC Corporation

• OKUYAMA Hiroshi

  SORTEC Corporation

• KUMAR Rakesh

  Oki Electric Industry Co., Ltd., Semiconductor Technology Laboratory

• NODA Shuichi

  Oki Electric Industry Co., Ltd., Semiconductor Technology Laboratory

• Okuyama H

  Kyoto Univ. Kyoto Jpn

• Yamashita Y

  Central Research Laboratory Hamamatsu Photonics K.k.

• Arakawa Tomiyuki

  Sortec Corporation:(present Address)oki Electric Industry Co. Ltd. Semiconductor Technology Laborato

• Ohta Takeo

  Tokyo-tokushukinzoku And Co

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