Contact Electrification on Thin Silicon Oxide in Vacuum
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概要
- 論文の詳細を見る
We investigated the microscopic dissipation of contact electrified charges on a thin SiO_2 film in vacuum where a thin layer of water may be adsorbed on the surface using an atomic force microscope (AFM). Charges with narrower spatial distributions were deposited in smaller amounts in vacuum than in air. Moreover, the deposited charge areas in vacuum showed no broadening with time after contact electrification. These demonstrate that the rapid surface diffusion of the charges in air may be caused by a water layer adsorbed on the insulator surfaces.
- 社団法人応用物理学会の論文
- 1994-07-15
著者
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SUGAWARA Yasuhiro
Department of Applied Physics, Graduate School of Engineering, Osaka University
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Sugawara Yasuhiro
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Uchihashi Takayuki
Department of Physics, Kanazawa University
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Okada T
Joint Research Center For Atom Technology (jrcat)
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OKUSAKO Takahiro
Department of Physics, Faculty of Science, Hiroshima University
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MORITA Seizo
Department of Physics, Faculty of Science, Hiroshima University
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Ohta Takayuki
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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YAMANISHI Yoshiki
Advanced Technology Research Laboratories, Sumitomo Metal Industries Ltd.
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OASA Takahiko
Advanced Technology Research Laboratories, Sumitomo Metal Industries Ltd.
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TSUYUGUCHI Takeshi
Department of Physics, Faculty of Science, Hiroshima University
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Uchihashi Takayuki
Jrcat-angstrom Technology Partnership (atp)
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Uchihashi Takayuki
Department Of Mathematics And Physics Grad School Of Natural Science And Technology Kanazawa Univ.
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Morita Seizo
Department Of Electronic Engineering Faculty Of Engineering Iwate University
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Yamanishi Yoshiki
Advanced Technology Research Laboratories Sumitomo Metal Industries Ltd.
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Uchihashi Takayuki
Joint Research Center For Atom Technology(jrcat) Angstrom Technology Partnership
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Sugawara Yasuhiro
Deparment Of Electrical Engineering Faculty Of Engineering Tohoku University
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Tsuyuguchi Takeshi
Department Of Physics Faculty Of Science Hiroshima University
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