Oxidation Site of Polycrystalline Silicon Surface Studied Using Scanning Force / Tunneling Microscope (AFM/STM) in Air

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-06-01

著者

• SUGAWARA Yasuhiro

  Department of Applied Physics, Graduate School of Engineering, Osaka University

• Sugawara Yasuhiro

  Department Of Applied Physics Graduate School Of Engineering Osaka University

• Ida T

  Inst. Physical And Chemical Res. (riken) Saitama Jpn

• Nakano A

  Hitachi Chemical Co. Ltd. Ibaraki Jpn

• Nakano Akihiko

  Molecular Membrane Biology Laboratory Riken(the Institute Of Physical And Chemical Research)

• Nakano A

  Molecular Membrane Biology Laboratory Riken (the Institute Of Physical And Chemical Research)

• NAKANO Akihiko

  Analysis Center, (IC) Group, Sharp Corpotation

• FUKANO Yoshinobu

  Department of Physics, Faculty of Science, Hiroshima University

• MORITA Seizo

  Department of Physics, Faculty of Science, Hiroshima University

• Ishizaka Tatsuya

  Research Institute Of Electrical Communication Tohoku University

• Morita Seizo

  Department Of Electronic Engineering Faculty Of Engineering Iwate University

• IDA Tohru

  Analysis Center, VLSI Development Laboratories, IC Group, Sharp Corporation

• Fukano Y

  Department Of Physics Faculty Of Science Hiroshima University

• Sugawara Yasuhiro

  Deparment Of Electrical Engineering Faculty Of Engineering Tohoku University

• Nakano Akihiko

  Analysis Center (ic) Group Sharp Corpotation

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