Effect of Surface Stress around the SA Step of Si(001) on the Dimer Structure Determined by Noncontact Atomic Force Microscopy at 5 K
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概要
- 論文の詳細を見る
Using noncontact atomic force microscopy (NC-AFM) at 5 K, we investigate the effect of surface stress around the SA step of Si(001) on the buckling of a surface dimer. Both topographic and dissipation images show different buckled dimer phases between the terraces, namely, the asymmetric c($4{\times}2$) phase in the upper terrace and the symmetric p($2{\times}1$) one in the lower terrace. In addition, we find, for the first time, that dimers in the vicinity of the step in the upper terrace were compressed by 3.6% in the dimer bond direction, as determined by the averaged profile analysis of the image. A variation in the surface dimer structure reflecting surface stress is demonstrated by dissipation image analysis, which points to the potential of NC-AFM for studying surface stress.
- Physical Society of Japanの論文
- 2010-01-15
著者
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Nomura Hikaru
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Naitoh Yoshitaka
Department Of Applied Chemistry Graduate School Of Engineering Osaka University
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Kageshima Masami
Department Of Applied Physics Graduate School Of Engineering Osaka University
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Sugawara Yasuhiro
Deparment Of Electrical Engineering Faculty Of Engineering Tohoku University
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Li Yan
Department Of Applied Chemistry Graduate School Of Engineering Kyushu University
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Li Yan
Department of Applied Physics, Graduate School of Engineering, Osaka University, Yamada-oka 2-1, Suita, Osaka 565-0871, Japan
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Sugawara Yasuhiro
Department of Applied Physics, Graduate School of Engineering, Osaka University, Yamada-oka 2-1, Suita, Osaka 565-0871, Japan
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Kageshima Masami
Department of Applied Physics, Graduate School of Engineering, Osaka University, Yamada-oka 2-1, Suita, Osaka 565-0871, Japan
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Naitoh Yoshitaka
Department of Applied Physics, Graduate School of Engineering, Osaka University, Yamada-oka 2-1, Suita, Osaka 565-0871, Japan
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