Structure and Deposition Mechanism of 10-Undecenoic Acid Self-Assembled Layers on H-Si (111) Surfaces Studied by Atomic Force Microscopy and Fourier-Transform Infrared
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概要
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Ten-undecenoic acid self-assembled multilayers were deposited on H-Si(111) surfaces and the surface morphology was investigated by atomic force microscopy (AFM). Namely, we studied the H-Si(111) surface modification of –COOH terminal functional groups. Characteristic islands of almost the same height are observed. From AFM images and transmission IR spectra, it was confirmed that multilayer deposition easily occurs through weak intermolecular interactions such as the Van der Waals force and hydrogen bond interactions. The growth mechanism and film structure were discussed.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-07-15
著者
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Haruyama Yuichi
Laboratory Of Advanced Science And Technology For Industry University Of Hyogo
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Tero Ryugo
Department Of Chemistry Graduate School Of Science The University Of Tokyo
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Urisu Tsuneo
Department Of Vacuum Uv Photoscience Institute For Molecular Science
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Nagata Toshi
Department Of Chemistry Faculty Of Science Kyoto University
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Nagasawa Takayuki
Department Of Vacuum Uv Photoscience Institute For Molecular Science
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Li Yan
Department Of Applied Chemistry Graduate School Of Engineering Kyushu University
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Li Yan
Department of Vacuum UV Photoscience, Institute for Molecular Science, Myodaiji, Okazaki 444-8585, Japan
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Haruyama Yuichi
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kanaji, Kamigori, Ako, Hyogo 678-1205, Japan
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Nagasawa Takayuki
Department of Vacuum UV Photoscience, Institute for Molecular Science, Myodaiji, Okazaki 444-8585, Japan
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Tero Ryugo
Department of Vacuum UV Photoscience, Institute for Molecular Science, Myodaiji, Okazaki 444-8585, Japan
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Urisu Tsuneo
Department of Vacuum UV Photoscience, Institute for Molecular Science, Myodaiji, Okazaki 444-8585, Japan
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