Hydrogen Diffusion and Chemical Reactivity with Water on Nearly Ideally H-terminated Si(100) Surface
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-06-30
著者
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Noda Hideyuki
Hitachi Ltd. Central Research Laboratory
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NONOGAKI Youichi
Department of Materials Science and Engineering, Graduate School of Engineering, Nagoya University
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URISU Tsuneo
Department of Vacuum UV Photoscience, Institute for Molecular Science
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Yabumoto Norikuni
Ntt Advanced Technology Corporation
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Urisu Tsuneo
Department Of Vacuum Uv Photoscience Institute For Molecular Science
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WANG Zhi-Hong
The Graduate University for Advanced Studies, Institute for Molecular Science
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Wang Zhi-hong
The Graduate University For Advanced Studies Institute For Molecular Science
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Nonogaki Youichi
Department Of Vacuum Uv Photoscience Institute For Molecular Science
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Nonogaki Youichi
Department Of Materials Science And Engineering Graduate School Of Engineering Nagoya University
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