Carbon Contamination in Synchrotron-Radiation-Stimulated Al Deposition Using a Low Temperature Condensed Layer of Dimethyl Aluminum Hydride

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-12-30

著者

• TSUSAKA Yoshiyuki

  Department of Physics, School of Science, Nagoya University

• URISU Tsuneo

  Department of Vacuum UV Photoscience, Institute for Molecular Science

• Urisu Tsuneo

  Department Of Vacuum Uv Photoscience Institute For Molecular Science

• IMAIZUMI Yoshiaki

  The Graduate University for Advanced Studies

• IBUKI Takashi

  Faculty of Science, Himeji Institute of Technology

• Ibuki Toshio

  Faculty Of Science Himeji Institute Of Technology

• Tsusaka Yoshiyuki

  Department Of Vacuum Uv Photoscience Institute For Molecular Science

• IBUKI Toshio

  Department of Vacuum UV Photoscience, Institute for Molecular Science

• Imaizumi Yoshiaki

  The Graduate University For Advanced Studies Institute For Molecular Science

関連論文

• ASCA Observations of the Spectrum of the X-Ray Background
• Thirty-Meter X-Ray Pencil Beam Line at the Institute of Space and Astronautical Science
• Structure and Deposition Mechanism of 10-Undecenoic Acid Self-Assembled Layers on H-Si(111) Surfaces Studied by Atomic Force Microscopy and Fourier-Transform Infrared
• The X-Ray Telescope on board ASCA
• Metal Abundance of an X-Ray Emitting Gas in Two Groups of Galaxies : The NGC 5044 Group and HCG 51
• Annealing and Synchrotron Radiation Irradiation Effects on Hydrogen Terminated Si(100) Surfaces Investigated by Infrared Reflection Absorption Spectroscopy
• Molecular Orientation and Photochemical Reaction of Organoaluminum Compounds Investigated by Buried Metal Layer Infrared Reflection Absorption Spectroscopy
• 500-nm-Resolution 10 keV X-Ray Imaging Transmission Microscope with Tantalum Phase Zone Plates
• Hydrogen Diffusion and Chemical Reactivity with Water on Nearly Ideally H-terminated Si(100) Surface
• 230 nm Resolution 10 keV X-Ray Imaging Transmission Microscope with Parallel Beam Illumination(Instrumentation, Measurement, and Fabrication Technology)
• 10keV X-Ray Phase-Contrast Microscopy for Observing Transparent Specimens : Instrumentation, Measurement, and Fabrication Technology
• Highly Excited States of Cyanogen Halides in the Extreme Vacuum Ultraviolet Region
• Photoabsorption Spectra of Si(CH_3O)_4, Si(CH_3O)_2(C_6H_5)_2, Si(C_2H_5O)_4, Ti(i-C_3H_7O), and BCl_3 in the Region of 6-9.6 eV
• Carbon Contamination in Synchrotron-Radiation-Stimulated Al Deposition Using a Low Temperature Condensed Layer of Dimethyl Aluminum Hydride
• Intitial Stage of Hydrogen Etching of Si Surfaces Investigated by Infrared Reflection Absorption Spectroscopy
• Structure and Deposition Mechanism of 10-Undecenoic Acid Self-Assembled Layers on H-Si (111) Surfaces Studied by Atomic Force Microscopy and Fourier-Transform Infrared

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