Low-Coherence Interferometry-Based Non-Contact Temperature Monitoring of a Silicon Water and Chamber Parts during Plasma Etching

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2010-05-25

著者

• ITO Masafumi

  Department of Pathology, Japanese Red Cross Nagoya Daiichi Hospital

• OHTA Takayuki

  Department of Quantum Engineering, Graduate School of Engineering, Nagoya University

• Ohta Takayuki

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Ohta Takayuki

  Department Of Opto-mechatronics Faculty Of Systems Engineering Wakayama University

• Ito Masafumi

  Department Of Electrical And Electronic Engineering Faculty Of Science And Technology Meijo Universi

• KOSHIMIZU Chishio

  Yamanashi Technology Development Center, Tokyo Electron AT Ltd.

• MATSUDO Tatsuo

  ES Core Technology Development Department, Tokyo Electron AT Ltd.

• TUCHITANI Shigeki

  Department of Opto-Mechatronics, Faculty of Systems Engineering, Wakayama University

• Matsudo Tatsuo

  Es Core Technology Development Department Tokyo Electron At Ltd.

• Koshimizu Chishio

  Yamanashi Technology Development Center Tokyo Electron At Ltd.

• Tuchitani Shigeki

  Department Of Opto-mechatronics Faculty Of Systems Engineering Wakayama University

• Ohta Takayuki

  Department Of Electrical And Electronic Engineering Faculty Of Science And Technology Meijo University

• Ohta Takayuki

  Department of Chemistry, Graduate School of Science, The University of Tokyo

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