Optically High Transparent SiN Mask Membrane with Low Stress Deposited by Low Pressure Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-12-30
著者
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YAMASHITA Yoshio
SORTEC Corporation
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Kumar R
Denso Corp. Aichi Jpn
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Kumar Rakesh
Chemical Branch Archaeological Survey Of India Kedar Gouri Road
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Koga Keisuke
Sortec Corporation
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Ohta Takayuki
Department Of Electronic Engineering Faculty Of Engineering Osaka University
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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HOGA Hiroshi
Toppan Printing Co., Lid.
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HOGA Hiroshi
Oki Electric Industry Co., Ltd.
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Hoga Hiroshi
Oki Electric Industry Co. Ltd.
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Ohta Tsuneaki
Optoelectronics Joint Research Laboratory
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Ohta Tuneaki
Oki Electric Industry Co. Ltd.
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Ohta Tsuneaki
Oki Ekectric Industry Co. Ltd.
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Ohta Tsuneaki
Oki Electric Industry Co. Ltd.
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Ohta T
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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KUMAR Rakesh
Oki Electric Industry Co., Ltd., Semiconductor Technology Laboratory
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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Ohta Takeo
Tokyo-tokushukinzoku And Co
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