Highly Sensitive and Stress-Free Chemically Amplified Negative Working Resist, TDUR-N9, for 0.1 μm Synchrotron Radiation (SR) Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-01-15
著者
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YAMASHITA Yoshio
SORTEC Corporation
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Tsuboi S
Assoc. Super‐advanced Electronics Technol. (aset) Kanagawa Jpn
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Yoshida Yoichi
The Institute Of Scientific And Industrial Research Osaka University
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Yamada Yasusada
Advanced Research Institute Waseda University:advanced Science Research Center Japan Atomic Energy R
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Yamashita Y
Power Supply Materials And Devices Laboratory Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Corporate R&d Center Toshiba Corporation
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Yamashita Yohachi
Toshiba Materials & Devices Research Laboratories
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Yamaguchi Yoh-ichi
Hoya Corporation
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TSUBOI Shinji
SORTEC Corporation
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MITSUI Soichiro
SORTEC Corporation
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Yamashita Yoshio
Sortec Corporation:(present Address) Oki Electric Industry Co. Ltd.
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Yamashita Yasuharu
Synthetic Crystal Research Laboratory School Of Engineering Nagoya University
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Shoki T
Hoya Corp. Tokyo Jpn
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Shoki Tsutomu
Hoya Corporation Ngl Development Center
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Mitsui S
Super-fine Sr Lithography Lab. Association Of Super-advanced Electronics Technologies (aset) Co Ntt
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Yamashita Y
Central Research Laboratory Hamamatsu Photonics K.k.
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