Conformal Chermical Vapor Deposition TiN(111) Film Formation as an Underlayer of Al for Highly Reliable Interconnects

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-01-30

著者

• Ohta Takayuki

  Department Of Electronic Engineering Faculty Of Engineering Osaka University

• Ohta Tsuneaki

  Optoelectronics Joint Research Laboratory

• Ohta Tuneaki

  Oki Electric Industry Co. Ltd.

• Ohta Tsuneaki

  Oki Ekectric Industry Co. Ltd.

• Ohta Tsuneaki

  Oki Electric Industry Co. Ltd.

• Takeyasu Nobuyuki

  Lsi Research Center Technical Research Division Kawasaki Steel Corporation

• Takeyasu Nobuyuki

  Lsi Research Center Kawasaki Steel Corporation

• Ohta T

  Matsushita Electric Industrial Co. Ltd. Osaka Jpn

• Ohta Tomohiro

  Lsi Research Center Kawasaki Steel Corporation

• KAIZUKA Takeshi

  LSI Research Center, Kawasaki Steel Corporation

• SHINRIKI Hiroshi

  LSI Research Center, Kawasaki Steel Corporation

• Ohta Takeo

  Tokyo-tokushukinzoku And Co

• Kaizuka Takeshi

  Lsi Research Center Kawasaki Steel Corporation

• Shinriki Hiroshi

  Advanced Technology Research Section Lsi Division Kawasaki Steel Corp.

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