Extremely Low ON-Resistance Metal to Metal Antifuses with Al/p-SiN/Al Structure for Next Generation FPGAs
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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KIMURA Yasukazu
Faculty of Technology, Tokyo University of Agriculture and Technology
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Kimura Yasukazu
Faculty Of Technology Tokyo University Of Agriculture And Technology
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Tamura Yoshimitsu
Advanced Technology Research Section, LSI division, Kawasaki Steel Corp.,
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Kimura Yoshitaka
Advanced Technology Research Section, LSI division, Kawasaki Steel Corp.,
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Tsutsui Chie
Advanced Technology Research Section, LSI division, Kawasaki Steel Corp.,
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Shinriki Hiroshi
Advanced Technology Research Section, LSI division, Kawasaki Steel Corp.,
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Shinriki Hiroshi
Advanced Technology Research Section Lsi Division Kawasaki Steel Corp.
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Tamura Y
Univ. Tokushima Tokushima Jpn
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Tsutsui Chie
Advanced Technology Research Section Lsi Division Kawasaki Steel Corp.
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TAMURA Yoshimitsu
Advanced Technology Research Section, LSI division, Kawasaki Steel Corp.
関連論文
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- Red Electroluminescence of Mn-doped CuAlS_2 Powder and Single Crystal
- Extremely Low ON-resistance Metal-to-Metal Antifuses with Al–Cu/10 nm-thick p-SiNx/Al–Cu Structure for Next Generation Very High Speed FPGAs (Field Programmable Gate Arrays)
- Extremely Low ON-Resistance Metal to Metal Antifuses with Al/p-SiN/Al Structure for Next Generation FPGAs