Thermal Chemical Vapor Deposition of Diamond from Methane-Hydrogen Gas System Pyrolized at Low Temperature (1450℃)
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概要
- 論文の詳細を見る
Thermal chemical vapor deposition (CVD) of diamond using a nozzle or a plate heated at much lower temperature than a conventional hot filament CVD was reported. The lowest temperature achieved for the pyrolysis of the material gas was 1450℃ for the methane-hydrogen mixture system. The gas-phase chemistry was then discussed in relation to both the experimentation and the corresponding numerical simulation.
- 社団法人応用物理学会の論文
- 1992-12-15
著者
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Kondoh Eiichi
Lsi Research Center Technical Research Division Kawasaki Steel Co.
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Ohta Tomohiro
Lsi Research Center Kawasaki Steel Corporation
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MITOMO Tohru
LSI Research Center, Technical Research Division, Kawasaki Steel Co.
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OHTSUKA Kenichi
LSI Research Center, Technical Research Division, Kawasaki Steel Co.
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Ohta Tomohiro
Lsi Research Center Technical Research Division Kawasaki Steel Co.
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Ohtsuka Kenichi
Lsi Research Center Technical Research Division Kawasaki Steel Co.
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Mitomo Tohru
Lsi Research Center Technical Research Division Kawasaki Steel Co.
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