Ohta Tomohiro | Lsi Research Center Kawasaki Steel Corporation

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著作論文

Conformal Chermical Vapor Deposition TiN(111) Film Formation as an Underlayer of Al for Highly Reliable Interconnects
Characterization of Direct-Contact Via Plug Formed by Using Selective Aluminum Chemical Vapor Deposition
Metalorganic Chemical Vapor Deposition of Aluminum-Copper Alloy Films
Improvement of Gap-Filling Property of O_3-tetraethylorthosilicate (TEOS) Film by Ethanol Surface Treatment
Reflection High-Energy Electron Diffraction Observation of Anti-Phase Domain Ordering of the 2×1 Reconstructed (111) Surface of Chemical-Vapor-Deposited Diamond
Self-Aligned Rapid Thermal Nitridation of TiSi_2 in NH_3 Ambient as a Diffusion Barrier Layer for Selective CVD-Al Contact Plug Formation
Thermal Chemical Vapor Deposition of Diamond from Methane-Hydrogen Gas System Pyrolized at Low Temperature (1450℃)
Diffusion Barrier Effects Against Cu of W -N Layer Formed by Electron Cyclotron Resonance Plasma Nitridation on W Layer

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