Simultaneous In situ Measurement of Silicon Substrate Temperature and Silicon Dioxide Film Thickness during Plasma Etching of Silicon Dioxide Using Low-Coherence Interferometry

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概要

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著者

• Ohta Takayuki

  Department Of Opto-mechatronics Faculty Of Systems Engineering Wakayama University

関連論文

• Low-Coherence Interferometry-Based Non-Contact Temperature Monitoring of a Silicon Water and Chamber Parts during Plasma Etching
• Simultaneous In situ Measurement of Silicon Substrate Temperature and Silicon Dioxide Film Thickness during Plasma Etching of Silicon Dioxide Using Low-Coherence Interferometry

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