Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-03-01
著者
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FUJI Hiroshi
Advanced Technology Research Laboratories, Sharp Corporation
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TOMINAGA Junji
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
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NAKANO Takashi
Advanced Optical Memory Group, National Institute for Advenced Interdisciplinary Research (NAIR)
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YAMAKAWA Yuzo
Corporate Research and Development Laboratory, Pioneer Co.
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ATODA Nobufumi
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
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Kim J
Digital Media R&d Center Samsung Electronics Co. Ltd.
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Fuji H
Sharp Corp. Nara Jpn
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Fuji Hiroshi
Advanced Technology Research Laboratories Sharp Corporation
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Yamakawa Yuzo
Center For Applied Near-field Optics Research (can-for) National Institute Of Advanced Industrial Sc
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Tominaga J
Center For Applied Near-field Optics Research (can-for) Aist
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Tominaga J
Chikumagawa The 1st Technical Center Tdk
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Tominaga Junji
Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research
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Atoda Nobufumi
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
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Atoda N
Sortec Ibaraki Jpn
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Atoda Nobufumi
Sortec
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Atoda Nobufumi
Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research
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Dorothea Buechel
Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research (nair)
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Atoda N
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
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KIM Jooho
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
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BUECHEL Dorothea
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
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Kim J.
Digital Media R&d Center Samsung Electronics Co. Ltd.
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Nakano T
Center For Applied Near-field Optics Research (can-for) National Institute Of Advanced Industrial Sc
関連論文
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- Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
- Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
- High Density Recording Capability of Laser-Assisted Magnetic Recording
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- Analysis of Deformation of X-Ray Mask Membrane in Aligner Motion
- Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure
- In-Ag-Te-Sb Phase Change Recording Media at Compact Disk Linear Velocity
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- New Recordable Compact Disc with Inorganic Material, AgO_x
- Thermal Origin of Readout Mechanism of Light-Scattering Super-Resolution Near-Field Structure Disk
- High-Speed Optical Near-Field Photolithography by Super Resolution Near-Field Structure
- Improvement of Super-RENS MO Disk Characteristics by Optimized Super-Resolution Near-Field Structure
- Super-Resolution Readout Using a Silver Scattering Center with Plasmon Excitation Generated in a Non-Magnetic Readout Layer
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- The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS)
- Near-Field Optical Simulation of Super-Resolution Near-Field Structure Disks
- Oxygen Doping Effects on Super-resolution Scattering-mode Near-field Optical Data Storage
- A Near-Field Recording and Readout Technology Using a Metallic Probe in an Optical Disk
- The Characteristics and the Potential of Super Resolution Near-Field Structure
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- Metal-Free Phthalocyanine Layer Prepared on Read-Only-Memory Disc for Super-Resolution Readout
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- An Approach to Lower the Threshold Laser Power of Super-Resolutional-Readout Optical Disk Using Silver Telluride Layer
- Scanning Tunneling Microscopy Image of GeSb_2Te_4 Thin Films
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- Electrical Properties of Nanometer-Width Refractory Metal Lines Fabricated by Focused Ion Beam and Oxide Resists
- 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists : Focused Ion Beam Process
- 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists
- Nanoscale Dots Fabrication by Volume Change Thermal Lithography
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- Mechanism of Resist Pattern Collapse during Development Process
- Dual Function of Thin MoO_3 and WO_3 Films as Negative and Positive Resists for Focused Ion Beam Lithography
- Study of the Crystallization of GeSbTe Films by Raman Spectroscopy
- Capacity Increase in Radial Direction of Super-Resolution Near-Field Structure Read-Only-Memory Disc
- 3D Simulation of Thin Film Inductor using Permalloy as a Conductor
- Newly Designed Spiral type Thin Film Inductor
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- Temperature Dependence of Complex Refractive Index of Sputtered Sb–Te Alloy Thin Films
- Readout Durability Improvement of Super-Resolution Near-Field Structure Discs with PtOx–SiO2 Recording and GeNy Interfacial Layers
- Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology
- Super-Resolution Near-Field Structure and Signal Enhancement by Surface Plasmons
- Temperature Dependence of the Thermal Properties of Optical Memory Materials
- Measurements of Temperature Dependence of Optical and Thermal Properties of Optical Disk Materials
- Near-Field Optical Simulation of Super-Resolution Near-Field Structure Disks
- Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure
- The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS)
- Optical Disc Simulation Program Unified by Electromagnetic and Thermal Distributions
- High-Speed Fabrication of Super-Resolution Near-Field Structure Read-Only Memory Master Disc using PtOx Thermal Decomposition Lithography
- Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers