Soft Magnetic Properties and Microstructures of As-sputtered Fe-M-O (M=Hf, Al) Films
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概要
- 論文の詳細を見る
Fe-M-O (M=Hf,Al) films are fabricated by Ar+O_2 reactive sputtering and their magnetic properties are investigated. Excellent soft magnetic properties at high frequency are obtained in Fe-Hf-O and Fe-Al-O thin films even in an as-deposited state; for example, Fe_<82>Hf_<3.4>O_<14.6> and Fe_<90.7>Al_2O_<7.3> films exhibit the values of 17.7 and 18.5 kG for saturation magnetization, 1.0 and 0.65 Oe for coercivity, and 2,200 and 3,000 for the effective permeability at 100 MHz, respectively. Microstructures, magnetic anisotropy and electrical resistivity are investigated to understand the magnetic properties of the thin films.
- 社団法人日本磁気学会の論文
- 1999-01-20
著者
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Kim J.
Dept. Of Obstetrics And Gynecology Yonsei University College Of Medicine
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Park J.
Thin Film Tech. Research Center Korea Institute Of Sci. & Tech.
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Kim S.
Thin Film Tech. Research Center, Korea Institute of Sci. & Tech.
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Kim K.
Thin Film Tech. Research Center, Korea Institute of Sci. & Tech.
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Han S.
Thin Film Tech. Research Center, Korea Institute of Sci. & Tech.
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Kim H.
Thin Film Tech. Research Center, Korea Institute of Sci. & Tech.
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Kim J.
Dept. Of Conservative Dentistry College Of Dentistry Chonbuk National University
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Kim H
Thin Film Tech. Research Center Korea Institute Of Sci. & Tech.
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Kim J.
Digital Media R&d Center Samsung Electronics Co. Ltd.
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Kim K
National Livestock Research Institute Rda
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Han S
Thin Film Tech. Research Center Korea Institute Of Sci. & Tech.
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Kim S
Thin Film Tech. Research Center Korea Institute Of Sci. & Tech.
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Kim J.
Dept. Of Bioresource Sciences Andong Univ. Korea
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Park J.Y.
Thin Film Tech. Research Center, Korea Institute of Sci. & Tech.
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Kim S.R
Thin Film Tech. Research Center, Korea Institute of Sci. & Tech.
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