Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1999-07-15
著者
-
TOMINAGA Junji
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
-
NAKANO Takashi
Advanced Optical Memory Group, National Institute for Advenced Interdisciplinary Research (NAIR)
-
ATODA Nobufumi
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR)
-
Fuji H
Sharp Corp. Nara Jpn
-
Fukaya Toshio
Center For Applied Near-field Optics Research (can-for) National Institute Of Advanced Industrial Sc
-
Fukaya Toshio
National Institute Of Materials And Chemical Research
-
Tominaga J
Center For Applied Near-field Optics Research (can-for) Aist
-
Tominaga J
Chikumagawa The 1st Technical Center Tdk
-
Tominaga Junji
Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research
-
Atoda Nobufumi
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
-
Atoda N
Sortec Ibaraki Jpn
-
Atoda Nobufumi
Sortec
-
Atoda Nobufumi
Advanced Optical Memory Group National Institute For Advanced Interdisciplinary Research
-
Sato A
Nagaoka Univ. Technol. Niigata Jpn
-
Fukaya T.
National Institute for Advanced Interdisciplinary Research (NAIR) Advanced Optical Memory Group
-
Atoda N.
National Institute for Advanced Interdisciplinary Research (NAIR) Advanced Optical Memory Group
-
Fuji Hiroshi
AVC Research Laboratory, Sharp Corp.
-
Sato Akira
Optical Technology Division, Minolta Co., Ltd.
-
Fukaya Toshio
Special Department for COE Projet, National Institute of Materials and Chemical Research
-
Sato A
National Inst. Advanced Industrial Sci. And Technol. Ibaraki Jpn
-
Atoda N
Laboratory For Advanced Optical Technology National Institute Of Advanced Industrial Science And Tec
-
Sato A
Takatsuka Laboratory Minolta Co.
-
Nakano T
Center For Applied Near-field Optics Research (can-for) National Institute Of Advanced Industrial Sc
-
Nakano Takashi
Advanced Optical Memory Group, National Institute for Advanced Interdisciplinary Research (NAIR), 1-1-4 Higashi, Tsukuba 305-8562, Japan
-
Fukaya Toshio
Special Department for COE Project, National Institute of Materals and Chemical Research, 1-1 Higashi,
-
Nakano Takashi
Advanced Optical Memory Group, NAIR, MITI
関連論文
- Observation of Eye Pattern on Super-Resolution Near-Field Structure Disk with Write-Strategy Technique
- Super-Resolution Read-Only Memory Disk with Metal Nanoparticles or Small Aperture
- Super-Resolution Near-Field Structure and Signal Enhancement by Surface Plasmons
- Photoluminescence Study of InAs Quantum Dots and Quantum Dashes Grown on GaAs(211)B
- (Ga, Mn)As /GaAs Diluted Magnetic Semiconductor Superlattice Structures Prepared by Molecular Beam Epitaxy
- In-situ Raman Scattering Spectroscopy for a Super Resolution Optical Disk during Readout
- Sub-nanosecond time-resolved structural measurements of the phase-change alloy Ge2Sb2Te5 (Special issue: Optical memories)
- Electroplated Reflection Masks for Soft X-Ray Projection Lithography
- Resist Performance in 5 nm Soft X-Ray Projection Lithography
- Reduction Imaging at 4.5 nm with Schwarzschild Optics
- Fabrication of 0.1μm Line-and-Space Patterns using Soft X-Ray Reduction Lithography
- Sub-0.1 μm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography
- High Density Recording Capability of Laser-Assisted Magnetic Recording
- Optical Properties of Metal-Oxide Films in Super-RENS
- Super-Resolutional Readout Disk with Metal-Free Phthalocyanine Recording Layer
- Spectroscopic Investigation of AgO_x Films for Super Resolution Near Field Structure Application
- Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers
- The Near-Field Super-Resolution Properties of an Antimony Thin Film
- Third Harmonic Generation Measurements for Halogen-Doped One-Dimensional Nickel Complexes
- Thermal Lithography for 100-nm Dimensions Using a Nano-Heat Spot of a Visible Laser Beam : Instrumentation, Measurement, and Fabrication Technology
- Readout Durability Improvement of Super-Resolution Near-Field Structure Discs with PtO_x-SiO_2 Recording and GeN_y Interfacial Layers
- Analysis of Deformation of X-Ray Mask Membrane in Aligner Motion
- Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure
- In-Ag-Te-Sb Phase Change Recording Media at Compact Disk Linear Velocity
- V and Ti Doping Effect on In-Ag-Te-Sb Optical Phase Change Rewritable Disc
- New Recordable Compact Disc with Inorganic Material, AgO_x
- Thermal Origin of Readout Mechanism of Light-Scattering Super-Resolution Near-Field Structure Disk
- High-Speed Optical Near-Field Photolithography by Super Resolution Near-Field Structure
- Improvement of Super-RENS MO Disk Characteristics by Optimized Super-Resolution Near-Field Structure
- Super-Resolution Readout Using a Silver Scattering Center with Plasmon Excitation Generated in a Non-Magnetic Readout Layer
- Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure
- The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS)
- Near-Field Optical Simulation of Super-Resolution Near-Field Structure Disks
- Oxygen Doping Effects on Super-resolution Scattering-mode Near-field Optical Data Storage
- A Near-Field Recording and Readout Technology Using a Metallic Probe in an Optical Disk
- The Characteristics and the Potential of Super Resolution Near-Field Structure
- Double Optical Phase Transition of GeSbTe Thin Films Sandwiched between Two SiN Layers
- Effect of SiO2 addition to PtOx recording layer of super-resolution near-field structure disc (Special issue: Optical memories)
- Metal-Free Phthalocyanine Layer Prepared on Read-Only-Memory Disc for Super-Resolution Readout
- Super-RENS Disk for Blue Laser System Retrieving Signals from Polycarbonate Substrate Side
- Readout Power Dependence of Signal Distribution Observed in Fourier Plane of Focus Spot
- An Approach to Lower the Threshold Laser Power of Super-Resolutional-Readout Optical Disk Using Silver Telluride Layer
- Scanning Tunneling Microscopy Image of GeSb_2Te_4 Thin Films
- New Nonvolatile Analog Memories for Analog Data Processing
- New Nonvolatile Analog Memories for Building Associative Memories
- Effect of Y-Doping on Resistance Degradation of Multilayer Ceramic Capacitors with Ni Electrodes under the Highly Accelerated Life Test
- Aging Behavior of Ni-Electrode Multilayer Ceramic Capacitors with X7R Characteristics
- Electrical Properties of Nanometer-Width Refractory Metal Lines Fabricated by Focused Ion Beam and Oxide Resists
- 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists : Focused Ion Beam Process
- 50-nm Metal Line Fabrication by Focused Ion Beam and Oxide Resists
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists : Beam-Induced Physics and Chemistry
- Patterned Alignment of Liquid Crystal on Photopolymer by Single-Exposure Photocuring Process
- A Novel Alignment Process in Liquid Crystal Cell Fabrication Using Reversible Poly (Vinyl-Cinnamate) Photoalignment Technique
- Focused Ion Beam Fabrication of Fine Metal Structures by Oxide Resists
- Nanoscale Dots Fabrication by Volume Change Thermal Lithography
- Signal Characteristics of Super-Resolution Near-Field Structure Disks with 100GB Capacity
- Super Resolution Read Only Memory Disc Using Super-Resolution Near-Field Structure Technology
- Signal Characteristics of Super-Resolution Near-Field Structure Disk in Blue Laser System
- Study on Chlorine Adsorbed Silicon Surface Using Soft-X-Ray Photoemission Spectroscopy
- Measurement of Sidewall Roughness by Scanning Tunneling Microscope : Inspection and Testing
- Measurement of Sidewall Roughness by Scanning Tunneling Microscope
- Mechanism of Resist Pattern Collapse during Development Process
- Dual Function of Thin MoO_3 and WO_3 Films as Negative and Positive Resists for Focused Ion Beam Lithography
- Study of the Crystallization of GeSbTe Films by Raman Spectroscopy
- Temperature Dependence of Complex Refractive Index of Sputtered Sb–Te Alloy Thin Films
- Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology
- Coupled boundary element-characteristics method for elastoplastic problem in rock engineering
- Super-Resolution Near-Field Structure and Signal Enhancement by Surface Plasmons
- Temperature Dependence of the Thermal Properties of Optical Memory Materials
- Measurements of Temperature Dependence of Optical and Thermal Properties of Optical Disk Materials
- Sub-Nanosecond Time-Resolved Structural Measurements of the Phase-Change Alloy Ge2Sb2Te5
- Near-Field Optical Simulation of Super-Resolution Near-Field Structure Disks
- Magneto-Optical Characteristics Enhanced by Super Resolution Near Field Structure
- The Effects of Metal-Doped GeSbTe Films on Light Scattering-Mode Super-Resolution Near-Field Structure (Super-RENS)
- Super-Resolutional Readout Disk with Metal-Free Phthalocyanine Recording Layer
- A Reversible Change of Reflected Light Intensity between Molten and Solidified Ge–Sb–Te Alloy
- Antimony Aperture Properties on Super-Resolution Near-Field Structure using Different Protection Layers