Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-01-15

著者

• 岡田 健治

  半導体MIRAI-ASET

• CHIBA Akio

  Waseda University

• Chiba Akira

  Euv Process Technology Research Laboratory Association Of Super-advanced Electronics Technologies (a

• Okada K

  Yamaguchi Univ. Yamaguchi Jpn

• Atoda Nobufumi

  Sortec

• Okada Kiyohiko

  Department Of Electrical And Electronic Engineering Yamaguchi University

• Futagami M

  Sortec Corporation:(present Address) Sony Corporation Atsugi Technology Center

• Chiba A

  Euv Process Technology Research Laboratory Association Of Super-advanced Electronics Technologies (a

• CHIBA Akira

  SORTEC Corporation

• FUTAGAMI Motonobu

  SORTEC Corporation

• OKADA Koichi

  SORTEC Corporation

• KATO Tadao

  ULSI Laboratory, Mitsubishi Electric Corporation

• Kato Tadao

  Ulsi Laboratory Mitsubishi Electric Corporation

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