Dynamic Oscillation Modes Caused by a PulsedX-Ray Exposure in an X-Ray Mask Membrane : X-Ray Lithography

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-04-30

著者

• CHIBA Akira

  SORTEC Corporation

• OKADA Koichi

  SORTEC Corporation

• Chiba Akira

  Sorted Corporation

• Okada Koichi

  Sorted Corporation

関連論文

• Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure
• Wafer Temperature Measurement and X-Ray Mask Temperature Evaluation in Synchrotron Radiation Lithography
• Dynamic Oscillation Modes Caused by a Pulsed X-Ray Exposure in an X-Ray Mask Membrane
• Dynamic Oscillation Modes Caused by a PulsedX-Ray Exposure in an X-Ray Mask Membrane : X-Ray Lithography
• Dynamic Thermal Distortions in an X-ray Mask Membrane During Pulsed X-Ray Exposure : Lithography Technology
• Dynamic Thermal Distortions in an X-ray Mask Membrane During Pulsed X-Ray Exposure
• Synchrotron Radiation Damage Mechanism of X-Ray Mask Membranes Irradiated in Helium Environment

スポンサーリンク