Wafer Temperature Measurement and X-Ray Mask Temperature Evaluation in Synchrotron Radiation Lithography

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High-k MOSFETに固有な移動度劣化機構の提案(IEDM(先端CMOSデバイス・プロセス技術))
キャリア分離法を用いた high-k stack ゲート絶縁膜のキャリア伝導及び絶縁性劣化機構の解析
Observation of Parallel and Perpendicular Propagations of Ion Sound Waves in a Linear Turbulently Heated Plasma
Ferroelectric Behavior in the Copolymer of Vinylidenefluoride and Trifluoroethylene
Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera(Instrumentation, Measurement, and Fabrication Technology)
Importance of Leakage Current Noise Analysis for Accurate Lifetime Prediction of High-k Gate Dielectrics
Ablative Acceleration of Pellet Shells Irradiated by External Soft X-ray Sources
Excitonic Structure of CuGaS_Se_ and CuAlS_Se_
Biexciton Luminescence from GaN Epitaxial Layers
Excitonic Emission in GaN Films on AlN Substrates Using Microwave-Excited N Plasma Method
Preheating Energy in a Soft-X-Ray-Accelerated Foil
Efficient Laser Absorption in Low Density Foam Target
Degradation Mechanism of HfAlO_x/SiO_2 Stacked Gate Dielectric Films through Transient and Steady State Leakage Current Analysis
Heat Sink Dependency of Mask In-Plane Displacement for Extreme Ultraviolet Lithography
Alternating Phase Shift Mask in Extreme Ultra Violet Lithography
Assessment of Heat Deformation and Throughput for Selecting Mask Substrate Material for Extreme Ultraviolet Lithography
Modeling of In-Plane Distortion of Extreme Ultraviolet Lithography Mask in Flat State
Thermal In-Plane Distortion Model of Mask for Extreme Ultraviolet Lithography during Periodic Scanning Exposure
Approach to Patterning of Extreme Ultraviolet Lithography Masks using Ru Buffer Layer : Surfaces, Interfaces, and Films
Thermal Behavior along Depth of Extreme Ultraviolet Lithography Mask during Dry Etching : Surfaces, Interfaces, and Films
Temperature Rise of Extreme Ultraviolet Lithography Mask Substrate during Dry Etching Process : Semiconductors
Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography
Theoretical Analysis of Placement Error due to Absorber Pattern on Extreme Ultraviolet Lithography Mask
Lamellar Structure in Melted-Slowly Cooled Vinylidene Fluoride/Trifluoroethylene (86/14) mol% Copolymer
Macrostructure of Melt-Crystallized Vinylidene Fluoride/Trifluoroethylene Copolymers (37/63, 65/35, 73/27 mol%)
Effect of Helium Gas Pressure on X-Ray Mask Heating during Synchrotron Radiation Exposure
Wafer Temperature Measurement and X-Ray Mask Temperature Evaluation in Synchrotron Radiation Lithography
Impact of Initial Traps on TDDB and NBTI Reliabilities in High-k Gate Dielectrics
Effects of Aluminum and Nitrogen Profile Control on Electrical Properties of HfAlON Gate Dielectric MOSFETs
A Comparative Study of Plasma Source-Dependent Charging Polarity in MOSFETs with High-k and SiO_2 Gate Dielectrics
Investigation of Switching Characteristics of Vinylidene Fluoride/Trifluoroethylene Copolymers in Relation to Their Structures
Ferroelectric Relaxation in a 65/35 mol% Copolymer of Vinylidene Fluoride and Trifluoroethylene
極薄ゲート酸化膜におけるストレス誘起リーフ電流と絶縁破壊
Atomic-Order Planarization of Ultrathin SiO_2/Si(001) Interfaces
An Experimental Evidence to Link the Origins of "A Mode" and "B Mode" Stress Induced Leakage Current
Extended Time Dependent Dielectric Breakdown Model Based on Anomalous Gate Area Dependence of Lifetime in Ultra Thin Silicon Dioxides
Extended TDDB Model Based on Anomalous Gate Area Dependence in Ultra Thin Silicon Dioxides
New Dielectric Breakdown Model of Local Wearout in Ultra Thin Silicon Dioxides
Alternating Phase Shift Mask in Extreme Ultra Violet Lithography
Dynamic Oscillation Modes Caused by a Pulsed X-Ray Exposure in an X-Ray Mask Membrane
Dynamic Oscillation Modes Caused by a PulsedX-Ray Exposure in an X-Ray Mask Membrane : X-Ray Lithography
Dynamic Thermal Distortions in an X-ray Mask Membrane During Pulsed X-Ray Exposure : Lithography Technology
Dynamic Thermal Distortions in an X-ray Mask Membrane During Pulsed X-Ray Exposure
Synchrotron Radiation Damage Mechanism of X-Ray Mask Membranes Irradiated in Helium Environment
Excitonic Emission in GaN Films on AlN Substrates Using Microwave-Excited N Plasma Method

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