Improvement of Phase-Shifter Edge Line Mask Method : Photolithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1992-04-30

著者

• Yamashita Yoshio

  Semiconductor Technology Lab. Oki Electric Industry Co. Ltd

• Jinbo Hideyuki

  Semiconductor Technology Lab. Oki Electric Industry Co. Ltd

• Jinbo Hideyuki

  Semiconductor Technology Lab. Oki Electric Industry Co. Lid.

• Yamashita Yoshio

  Semiconductor Technology Lab. Oki Electric Industry Co. Lid.

関連論文

• Chemically Amplified Bilevel Resist Based on Condensation of Siloxanes : Resist and Processes
• Chemically Amplified Bilevel Resist Based on Condensation of Siloxanes
• Improvement of Phase-Shifter Edge Line Mask Method : Photolithography
• Improvement of Phase-Shifter Edge Line Mask Method

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