Tsubouchi K | Tohoku Univ. Sendai Jpn
スポンサーリンク
概要
関連著者
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TSUBOUCHI Kazuo
Research Institute of Electrical Communication, Tohoku University
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Tsubouchi K
Tohoku Univ. Sendai Jpn
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Tsubouchi Kazuo
Research Institute Of Electrical Communicaiton Tohoku University
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TSUBOUCHI Kazuo
Research Institute of Electric Communication (RIEC), Tohoku University
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Masu Kazuya
Research Institute Of Electrical Communication Tohoku University
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Masu Kazuya
Integrated Research Institute
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Masu K
Research Institute Of Electrical Communication Tohoku University
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Masu Kazuya
東工大
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Mikoshiba N
Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University
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Mikoshiba Nobuo
Research Institute Of Electorical Communication Tohoku University
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YOKOYAMA Michio
Research Institute of Electrical Communication, Tohoku University
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Yokoyama M
Kawasaki Heavy Ind. Ltd. Chiba Jpn
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Lee C‐h
Lg Electronics Inst. Technol. Seoul Kor
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Lee C‐h
Keimyung Univ. Daegu Kor
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Suzuki Nobuhiro
The Faculty Of Engineering Tokyo Institute Of Technology
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LEE Chang-Hun
Research Institute of Electrical Communication, Tohoku University
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Lee Chang-hun
Research Institute Of Electrical Communication Tohoku University
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Suzuki N
Hitachi Ltd. Tokyo Jpn
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NAKAMURA Hiromichi
Research Institute of Electrical Communication, Tohoku University
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Matsuhashi Hideki
Research Institute of Electrical Communication, Tohoku University
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Matsuhashi H
Oki Electric Ind. Co. Ltd. Tokyo Jpn
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Hiura Yohei
Research Institute of Electrical Communication, Tohoku University
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Hiura Y
Research Institute Of Electrical Communication Tohoku University:(present Address) Toshiba Corp.
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YI You-Wen
Research Institute of Electrical Communication, Tohoku University
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Yi You-wen
Hewlett-packard Laboratories Japan
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Suzuki Nobumasa
Production Engineering Research Laboratory Canon Inc.
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Fukuda Tsuguo
Optoelectronics Joint Research Laboratory
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Komeya Katutoshi
Graduate School Of Environment And Information Science Yokohama National University
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Kondo Kazuhiro
Fujitsu Laboratories Ltd.
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Kondo K
Fujitsu Laboratories Ltd.
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NISHIMURA Takamasa
Research Institute of Electrical Communication, Tohoku University
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GOTOH Akio
Research Institute of Electrical Communication, Tohoku University
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Nishimura Tadashi
Lsi Research & Development Laboratory Mitsubishi Electric Corporation
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Matano Tatsuya
Research Institute Of Electrical Communication Tohoku University
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Nishimura T
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Ohmi Tadahiro
Department Of Electronic Engineering
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KONDO Kaoru
RION CO., Ltd.
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ICHIJO Kazuo
RION CO., Ltd.
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HOSHINA Tamio
RION CO., Ltd.
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Ichijo Kazuo
Rion Co. Ltd.
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Shimano S
Department Of Upland Farming National Agricultural Research Center For Tohoku Region
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Shimano Satoshi
Research Institute Of Electrical Communication Tohoku University
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SUZUKI Nobumasa
Production Engineering Research Laboratory, Canon Inc.
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Hoshina Tamio
Rion Co. Ltd.
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Gotoh Akio
Research Institute Of Electrical Communication Tohoku University
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Niina T
Microelectronics Research Center Sanyo Electric Co. Ltd.
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Saito Tetsuya
Research Institute Of Electrical Communication Tohoku University
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Morimoto Akihiro
Research Institute Of Electrical Communication Tohoku University
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TACHIBANA Ryoichi
Research Institute of Electrical Communication, Tohoku University
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Yoshikawa T
Division Of Mechanical Engineering Department Of Mechanical Science And Bioengineering Graduate Scho
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SHINOHARA Keisuke
RION CO., Ltd.
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TANAKA Masanori
Research Institute of Electrical Communication, Tohoku University
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HAYASHI Shigeki
Shimadzu Corporation
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MARUI Takao
Shimadzu Corporation
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TERAMOTO Akira
Shimadzu Corporation
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KAJIKAWA Tetsuo
Shimadzu Corporation
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SOEJIMA Hiroyoshi
Shimadzu Corporation
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Sasaki Keiichi
Research Institute Of Electrical Communication Tohoku University
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YOSHIKAWA Toshiaki
Production Engineering Research Laboratory, Canon Inc.
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SUZUKI Nobumasa
Research Institute of Electrical Communication, Tohoku University
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ANAYAMA Chikashi
Research Institute of Electrical Communication, Tohoku University
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HIURA Yuko
Research Institute of Electrical Communication, Tohoku University
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Hidaka T
Shonan Inst. Technol. Kanagawa Jpn
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Tachibana Ryoichi
Research Institute Of Electrical Communication Tohoku University
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Yoshikawa Toshiaki
Production Engineering Research Laboratory Canon Inc.
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Hiura Yuko
Research Institute Of Electrical Communication Tohoku University:(present Address)nippon Electric Co
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Saito Tetsuya
Research & Development Center Fuso Pharmaceutical Industries
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Anayama Chikashi
Research Institute Of Electrical Communication Tohoku University
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Shinohara K
National Institute Of Info. & Com. Tech.
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HIDAKA Tetsuya
Research Institute of Electrical Communication, Tohoku University
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Lee Chang-Hum
Research Institute of Electrical Communication, Tohoku University
著作論文
- A High-Efficiency CMOS Class-B Push-Pull Power Amplifier for Code-Division-Multiple-Access Cellular System
- Aluminum Chemical Vapor Deposition Technology for High Deposition Rate and Surface Morphology Improvement
- Crystallographic Structures and Parasitic Resistances of Self-Aligned Silicide TiSi_2/Self-Aligned Nitrided Barrier Layer/Selective Chemical Vapor Deposited Aluminum in Fully Self-Aligned Metallization Metal Oxide Semiconductor Field-Effect Transistor
- Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization Metal-Oxide-Semiconductor Field-Effect-Transistor
- Self-Aligned 10-nm Barrier Layer Formation Technology for Fully Self-Aligned Metallization MOSFET
- In-Situ Counting of Process-Induced Particles
- Particle Counting in Semiconductor Processing Gas and Apparatus with a New Flow-Cell-Type Laser Particle Counter
- Single Crystallization of Aluminum on SiO_2 by Thermnal Annealing and Observation with Scanning μ-RHEED Microscope
- Development of Scanning μ-RHEED Microscopy for Imaging Polycrystal Grain Structure in LSI (SOLID STATE DEVICES AND MATERIALS 1)
- High-Rate Deposition of High-Quality Silicon Nitride Film at Room Temperature by Quasi-Remote Plasma Chemical Vapor Deposition
- In Situ Observation of Electromigration in Cu Film Using Scanning μ-Reflection High-Energy Electron Diffraction Microscope
- Planarized Deposition of High-Quality Silicon Dioxide Film by Photoassisted Plasma CVD at 300℃ Using Tetraethyl Orthosilicate
- Evaluation of LaB_6 Thin Film as Low-Work-Function Gate for MOSFET Operated at Low Temperature
- Silicon Nitride Films with Low Hydrogen Content, Low Stress, Low Damage and Stoichiometric Composition by Photo-Assisted Plasma CVD
- Temperature-Scaling Theory for Low-Temperature-Operated MOSFET with Deep-Submicron Channel : Semiconductors and Semiconductor Devices
- Pyrolysis and Photolysis of Trimethylaluminum
- Nondestructive and Noncontact Observation of Microdefects in GaAs Wafers with a New Photo-Thermal-Radiation Microscope
- Nondestructive and Noncontact Observation of Microdefects in GaAs Wafers with a New Photo-Thermal-Radiation Microscope
- Nondestructive and Noncontact Evaluation of Semiconductors by Photothermal Radiometry : Photoacoustic Spectroscopy
- Observation of Nonradiative Processes in Benzene Vapor by Photoacoustic Spectroscopy
- Area-Selective Aluminum Patterning Using Atomic Hydrogen Resist
- Matched Filter Type SET Circuit for Room Temperature Operation
- Reliability of Single Electron Transistor Circuits Based on E_b/N_0-Bit Error Rate Characteristics
- Low-Temperature Metal-Oxide-Semiconductor Field-Effect Transistor Operation by Temperature Scaling Theory