High-Rate Deposition of High-Quality Silicon Nitride Film at Room Temperature by Quasi-Remote Plasma Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 1995-12-30
著者
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Masu K
Research Institute Of Electrical Communication Tohoku University
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Masu Kazuya
Integrated Research Institute
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Masu Kazuya
Research Institute Of Electrical Communication Tohoku University
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TSUBOUCHI Kazuo
Research Institute of Electrical Communication, Tohoku University
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Masu Kazuya
東工大
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Suzuki Nobuhiro
The Faculty Of Engineering Tokyo Institute Of Technology
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Tsubouchi K
Tohoku Univ. Sendai Jpn
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Tsubouchi Kazuo
Research Institute Of Electrical Communicaiton Tohoku University
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Suzuki N
Hitachi Ltd. Tokyo Jpn
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Suzuki Nobumasa
Production Engineering Research Laboratory Canon Inc.
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TSUBOUCHI Kazuo
Research Institute of Electric Communication (RIEC), Tohoku University
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