Growth of Atomically Flat-Surface Aluminum Nitride Epitaxial Film by Metalorganic Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-05-15
著者
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NAKASE Hiroyuki
Research Institute of Electrical Communication Tohoku University
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Kameda Suguru
Research Institute Of Electrical Communication Tohoku University
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TSUBOUCHI Kazuo
Research Institute of Electrical Communication, Tohoku University
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UEHARA Kensei
Research Institute of Electrical Communication, Tohoku University
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AOTA Yuji
Research Institute of Electrical Communication, Tohoku University
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ISOTA Yoji
Research Institute of Electrical Communication, Tohoku University
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Aota Yuji
Research Institute Of Electrical Communication Tohoku University
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