Evaluation of LaB_6 Thin Film as Low-Work-Function Gate for MOSFET Operated at Low Temperature

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1990-09-20

著者

• Masu Kazuya

  Integrated Research Institute

• Masu Kazuya

  Research Institute Of Electrical Communication Tohoku University

• TSUBOUCHI Kazuo

  Research Institute of Electrical Communication, Tohoku University

• Mikoshiba N

  Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L

• Mikoshiba Nobuo

  Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L

• Mikoshiba Nobuo

  Research Institute Of Electrical Communication Tohoku University

• YOKOYAMA Michio

  Research Institute of Electrical Communication, Tohoku University

• Tsubouchi K

  Tohoku Univ. Sendai Jpn

• Yokoyama M

  Kawasaki Heavy Ind. Ltd. Chiba Jpn

• Tsubouchi Kazuo

  Research Institute Of Electrical Communicaiton Tohoku University

• YI You-Wen

  Research Institute of Electrical Communication, Tohoku University

• Yi You-wen

  Hewlett-packard Laboratories Japan

• Mikoshiba Nobuo

  Research Institute Of Electorical Communication Tohoku University

• TSUBOUCHI Kazuo

  Research Institute of Electric Communication (RIEC), Tohoku University

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