Mikoshiba N | Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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概要
- 同名の論文著者
- Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard Lの論文著者
関連著者
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Mikoshiba N
Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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Mikoshiba Nobuo
Research Institute Of Electorical Communication Tohoku University
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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TSUBOUCHI Kazuo
Research Institute of Electrical Communication, Tohoku University
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TSUBOUCHI Kazuo
Research Institute of Electric Communication (RIEC), Tohoku University
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Tsubouchi K
Tohoku Univ. Sendai Jpn
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Tsubouchi Kazuo
Research Institute Of Electrical Communicaiton Tohoku University
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Morita Seizo
Research Institute Of Electrical Communication Tohoku University
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Masu Kazuya
Integrated Research Institute
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Masu Kazuya
Research Institute Of Electrical Communication Tohoku University
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MORITA Seizo
Research Institute of Electrical Communication, Tohoku University
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Masu K
Research Institute Of Electrical Communication Tohoku University
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NAKAMURA Hiromichi
Research Institute of Electrical Communication, Tohoku University
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Morita S
National Institute For Fusion Science
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Morimoto Shigeyuki
Plasma Physics Laboratory Kyoto University:(present Address) National Institute For Fusion Science
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Morimoto Shigeyuki
Plasma Physics Laboratory Kyoto University
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FUKASE Tetsuo
The Research Institute for Iron,Steel and Other Metals,Tohoku University
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Morita S
National Inst. Fusion Sci. Gifu Jpn
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Koike Yoji
The Research Institute For Iron Steel And Other Metals Tohoku University
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Fukase Tetsuro
Institute For Materials Research Tohoku University
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Fukase Tetsuo
The Research Institute For Iron Steel And Other Metals
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Fukase Tetsuo
Institute For Materials Reserch Tohoku University
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Morita S
Osaka Univ. Osaka Jpn
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NOGUCHI Takashi
Research and Development Dept., Semiconductor Group, SONY
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Funase Tetsuo
Institute For Material Research Tohoku University
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Suzuki Nobuhiro
The Faculty Of Engineering Tokyo Institute Of Technology
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Fukase T
Institute For Materials Research Tohoku University
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ISHIDA Shuichi
Department of Physics,Faculty of Science,Osaka University
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Morita S
Department Of Electrical Engineering Nagoya University
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Ishida Shuichi
Division Of Cardiovascular Medicine Department Of Internal Medicine Ohmori Hospital Toho University
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Hiura Yohei
Research Institute of Electrical Communication, Tohoku University
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Hiura Y
Research Institute Of Electrical Communication Tohoku University:(present Address) Toshiba Corp.
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Suzuki N
Hitachi Ltd. Tokyo Jpn
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Ishida Shuichi
Department Of Physics Faculty Of Science Osaka University
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Noguchi Takashi
Research Institute Of Electrical Communication Tohoku University
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Noguchi Takashi
Research And Development Dept. Semiconductor Group Sony
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Morimoto Shigemitsu
Department Of Prime Mover Engineering School Of Engineering Tokai University
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Fukuda Tsuguo
Optoelectronics Joint Research Laboratory
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Okada T
Joint Research Center For Atom Technology (jrcat)
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Masu Kazuya
東工大
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Tsukada Shuichi
Research Institute Of Electrical Communication Tohoku University
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OKADA Takao
Olympus Optical Co., Ltd.
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ISHIGAME Yuri
Research Institute of Electrical Communication, Tohoku University
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Ohta Tsuneaki
Optoelectronics Joint Research Laboratory
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Ohta Tuneaki
Oki Electric Industry Co. Ltd.
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Morita Shigenori
Department Of Electronic Engineering Osaka University
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Matano Tatsuya
Research Institute Of Electrical Communication Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering
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Ohta T
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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KITAGAWA Michiharu
Radiation Center of Osaka Prefecture
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Okada T
Faculty Of Science Gakushuin University
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Ishigame Yuri
Research Institute Of Electrical Communication Tohoku University
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SUZUKI Nobumasa
Production Engineering Research Laboratory, Canon Inc.
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YI You-Wen
Research Institute of Electrical Communication, Tohoku University
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Yi You-wen
Hewlett-packard Laboratories Japan
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Suzuki Nobumasa
Production Engineering Research Laboratory Canon Inc.
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Kitagawa M
Radiation Center Of Osaka Prefecture
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Kitagawa Michiharu
Radiation Center Of Osaka
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YOKOYAMA Michio
Research Institute of Electrical Communication, Tohoku University
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OTSUKA Ichiro
Department of Chemistry, Tohoku Dental University
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YOKOYAMA Hiraku
Aoba Riken Co., Ltd.
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IWASAKI Takatoshi
Department of Physics, Tohoku Dental University
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Ohta Tsuneaki
Oki Electric Industry Co. Ltd.
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Yoshikawa T
Division Of Mechanical Engineering Department Of Mechanical Science And Bioengineering Graduate Scho
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Sato C
Hokkaido Inst. Public Health Sapporo Jpn
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Otsuka Ichiro
Department Of Chemistry Tohoku Dental University
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Yokoyama M
Kawasaki Heavy Ind. Ltd. Chiba Jpn
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SATO Chiaki
Olympus Optical Co., Lid.
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Iwasaki Takatoshi
Department Of Physics Tohoku Dental University
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TANAKA Masanori
Research Institute of Electrical Communication, Tohoku University
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HAYASHI Shigeki
Shimadzu Corporation
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MARUI Takao
Shimadzu Corporation
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TERAMOTO Akira
Shimadzu Corporation
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KAJIKAWA Tetsuo
Shimadzu Corporation
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SOEJIMA Hiroyoshi
Shimadzu Corporation
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YOSHIKAWA Toshiaki
Production Engineering Research Laboratory, Canon Inc.
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SUZUKI Nobumasa
Research Institute of Electrical Communication, Tohoku University
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ANAYAMA Chikashi
Research Institute of Electrical Communication, Tohoku University
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HIURA Yuko
Research Institute of Electrical Communication, Tohoku University
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Suemune Ikuo
Department Of Physical Electronics Faculty Of Engineering Hiroshima University
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Yoshikawa Toshiaki
Production Engineering Research Laboratory Canon Inc.
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Yokoyama Hiraku
Aoba Riken Co. Ltd.
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Yamanishi Masamichi
Department Of Physical Electronics Hiroshima University
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Yamanishi Masamichi
Department Of Electrical Engineering College Of Engineering University Of Osaka Prefecture
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Hiura Yuko
Research Institute Of Electrical Communication Tohoku University:(present Address)nippon Electric Co
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TAKADO Seiichi
Research Institute of Electrical Communication, Tohoku University
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OHSAWA Keishi
Research Institute of Electrical Communication, Tohoku University
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NONOMURA Kazuhiro
Department of Physical Electronics, Hiroshima University
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Anayama Chikashi
Research Institute Of Electrical Communication Tohoku University
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Ohsawa Keishi
Research Institute Of Electrical Communication Tohoku University
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Nonomura Kazuhiro
Department Of Physical Electronics Hiroshima University:(present Address)fujitsu Ltd.
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Takado Seiichi
Research Institute Of Electrical Communication Tohoku University
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Sato Chiaki
Olympus Optical Co. Lid.
著作論文
- Construction of a Scanning Tunneling Microscope for Electrochemical Studies
- Multilayer Piezoelectric Actuators for Scanning Tunneling Microscope : High Power Ultrasonics
- Temperature Dependence of the Inelastic Scattering Time in Metallic n-GaAs
- Determination of Physical Parameters of the Anderson Localization in Metallic n-InSb
- Effects of the Anderson Localization on Magnetoconductivity in Metallic n-GaAs
- Voltage-Dependence of Scanning Tunneling Microscopy on Titanium Surface in Air
- Atomic Images of Disordered Regions in Graphite Crystals Obtained with Scanning Tunneling Microscope
- Atomic Corrugation of Kish Graphite in Air Measured with Scanning Tunneling Microscope
- Single Crystallization of Aluminum on SiO_2 by Thermnal Annealing and Observation with Scanning μ-RHEED Microscope
- Development of Scanning μ-RHEED Microscopy for Imaging Polycrystal Grain Structure in LSI (SOLID STATE DEVICES AND MATERIALS 1)
- In Situ Observation of Electromigration in Cu Film Using Scanning μ-Reflection High-Energy Electron Diffraction Microscope
- Planarized Deposition of High-Quality Silicon Dioxide Film by Photoassisted Plasma CVD at 300℃ Using Tetraethyl Orthosilicate
- Evaluation of LaB_6 Thin Film as Low-Work-Function Gate for MOSFET Operated at Low Temperature
- Silicon Nitride Films with Low Hydrogen Content, Low Stress, Low Damage and Stoichiometric Composition by Photo-Assisted Plasma CVD
- Temperature-Scaling Theory for Low-Temperature-Operated MOSFET with Deep-Submicron Channel : Semiconductors and Semiconductor Devices
- Pyrolysis and Photolysis of Trimethylaluminum
- Nondestructive and Noncontact Observation of Microdefects in GaAs Wafers with a New Photo-Thermal-Radiation Microscope
- Nondestructive and Noncontact Observation of Microdefects in GaAs Wafers with a New Photo-Thermal-Radiation Microscope
- Nondestructive and Noncontact Evaluation of Semiconductors by Photothermal Radiometry : Photoacoustic Spectroscopy
- Observation of Nonradiative Processes in Benzene Vapor by Photoacoustic Spectroscopy
- Quasi-Nondestructive Observation of Oxidation-Induced Stacking Faults in Silicon by Photoacoustic Topography
- Tunneling-Type Temperature Dependence of Critical Current in Nb-Sn Point Contact
- Effect of the Shunt Capacitance on the ac Josephson Effect in Nb Point Contacts
- Peak Shifts ot the Photo-Induced Magnetophonon Resonance in n-InSb at 4.2 K
- 4-5 μm Emissions from 1.3-μm and 1.5-μm InGaAsP/InP Lasers : Evidence for Excitations in Split-Off Valence Band