Ohmi Tadahiro | Department Of Electronic Engineering
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概要
関連著者
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Ohmi Tadahiro
Department Of Electronic Engineering
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Shibata Tadashi
Department Of Electrical Engineering And Information Systems School Of Engineering The University Of
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SHIBATA Tadashi
Department of Physics,Faculty of Science,Osaka University
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Morita Mizuho
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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MORITA Mizuho
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University
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Nakada A
Vlsi Design And Education Center The University Of Tokyo
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NAKADA Akira
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Ino Kazuhide
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Shibata Tadashi
Department Of Information And Communication Engineering The University Of Tokyo
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Shibata T
Department Of Information And Communication Engineering The University Of Tokyo
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Shibata T
Ntt Photonics Laboratories Ntt Corporation:(present Address)ntt Science And Core Technology Group Nt
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Shibata T
Univ. Tokyo Tokyo Jpn
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Ohmi Tadahiro
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Morita M
Department Of Electronics Tohoku University
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Morita M
Advanced Materials & Technology Research Laboratories Nippon Steel Corporation
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HIRAYAMA Masaki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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MAKIHARA Koji
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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INO Kazuhide
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Hirayama Masaki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Oka Maurichio
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Choi Geun-min
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Makihara K
Department Of Electronics Tohoku University
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Makihara Koji
Department Of Applied Chemistry Graduate School Of Engineering Kyushu University
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KANEMOTO Kei
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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OKA Mauricio
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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TAMAI Yukio
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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SEKINE Katsuyuki
Department of Electronic Engineering, Graduate school of Engineering, Tohoku University
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TERAMOTO Akinobu
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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TANIGUCHI Yoshiyuki
Department of Electronic Engineering, Graduate School of Engineering, Tohoku University
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Teramoto Akinobu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Tamai Yukio
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Kanemoto Kei
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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VERHAVERBEKE Steven
Department of Electronics, Faculty of Engineering Tohoku University
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Nose Masashi
Department Of Electronics Faculty Of Engineering Tohoku University
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大見 忠弘
東北大学未来科学技術共同研究センター
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森田 浩
大阪大学 大学院 情報科学研究科
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Morita Hiroshi
Department of Cardiology, Shingu Munichipal Hospital
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Kotani K
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Kotani Koji
Graduate School Of Engineering Tohoku University
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和田 智史
東京工業大学大学院理工学研究科材料工学専攻
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Masu K
Research Institute Of Electrical Communication Tohoku University
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Masu Kazuya
Integrated Research Institute
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Masu Kazuya
Research Institute Of Electrical Communication Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering Tohoku University
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Ohmi Tadahiro
Department Of Electronics Faculty Of Engineering Tohoku University
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Hattori Takeo
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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AHARONI Herzl
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Hattori Tetsuya
Depaetment Of Electrical And Electronic Engineering Tokyo Institute Of Technology
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Aharoni Herzl
東北大学未来科学技術共同研究センター
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TSUBOUCHI Kazuo
Research Institute of Electrical Communication, Tohoku University
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Shimomura S
Graduate School Of Science And Engineering Ehime University
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Shimomura Satoshi
Department Of Physical Science Graduate School Of Engineering Science Osaka University
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Wada Satoshi
Department Of Physics Graduate School Of Science Tokyo University Of Science
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NAKAMURA Kou
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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OHMI Kazuyuki
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Mikoshiba N
Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University:(present Address) Hewlett-packard L
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Mikoshiba Nobuo
Research Institute Of Electrical Communication Tohoku University
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Ohmi T
Tohoku Univ. Sendai Jpn
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Kotani K
Tohoku Univ. Sendai‐shi Jpn
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Hattori Takashi
Central Research Laboratory Hitachi Ltd.
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Shibata Tadashi
Department Of Electronic Engineering Tohoku University
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Shindo Wataru
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Taniguchi Yoshio
Department Of Functional Polymer Science Faculty Of Textile Science And Technology Shinshu Universit
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Taniguchi Yoshio
Advanced Research Laboratory Hitachi Ltd.
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Verhaverbeke S
Department Of Electronics Faculty Of Engineering Tohoku University
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Tsubouchi K
Tohoku Univ. Sendai Jpn
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Ino Kazuhide
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University:laboratory For
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Ohmi Kazuyuki
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Hattori Takeo
Department Of Electrical & Electronic Engineering Musashi Institute Of Technology
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Kimura Mikihiro
Department Of Electronic Engineering Tohoku University
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NOSE Masashi
Department of Electronics, Faculty of Engineering Tohoku University
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Hirayama M
Tohoku Univ. Sendai Jpn
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IWAMOTO Toshiyuki
Department of Polymer Science and Engineering, Faculty of Textile Science, Kyoto Institute of Techno
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Hiura Yohei
Research Institute of Electrical Communication, Tohoku University
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Hiura Y
Research Institute Of Electrical Communication Tohoku University:(present Address) Toshiba Corp.
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MESSOUSSI Rochdi
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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YABUNE Tatsuhiro
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Tsubouchi Kazuo
Research Institute Of Electrical Communicaiton Tohoku University
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Murayama Kimio
Department Of Electronics Tokyo Institute Of Technology:(present Address)tokyo Data Center
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Shindo W
Tohoku Univ. Sendai Jpn
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Ueda T
Process Development Center Sharp Corporation
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KOMEDA Hiroyuki
Department of Electronic Engineering, Tohoku University
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UEDA Tohru
Process development Center, Sharp Corporation
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WADA Sakae
Process development Center, Sharp Corporation
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YAMAMOTO Tetsuya
Department of Neurosurgery, Graduate School of Comprehensive Human Sciences, University of Tsukuba
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野平 博司
Musashi Institute Of Technology
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SASAKI Makoto
Department of Radiology, Iwate Medical University
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Kotani Koji
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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OHMI Tadahiro
New Industry Creation Hatchery Center, Tohoku University
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NITTA Takahisa
Device Development Center, Hitachi, Ltd.
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SAITO Kenji
Department of Hematology, Dokkyo Medical School of Medicine
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NAKAMURA Yoshio
Department of Chemistry, Faculty of Sciece, Konan University
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ANDO Makoto
Department of Electrical and Electronic Engineering, Tokyo Institute of Technology
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Kawai Yasuaki
Department Of Physiology Faculty Of Medicine Tottori University
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KIM Jong-Soo
Department of Production Engineering, Korea Advanced Institute of Science and Technology
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OGAWA Hiroki
Department of Surgery, Otsu Red Cross Hospital
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Kawai Yasuaki
Department Of Electronics Faculty Of Engineering Tohoku University
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Ito Kentaro
Department Of Psychiatry Tokyo Medical University
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Kim J‐s
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Kotani Koji
Laboratory For Electronic Intelligent Systems Research Institute Of Electrical Communication Tohoku
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Suyama M
The Author Is With Optical Submarine Transmission Division Fujitsu Limited
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Morita M
Department Of Information Science Graduate School Of Information Sciences Tohoku University:laborato
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Morita Mizuho
Department Of Electronic Engineering Faculty Of Engineering Tohoku University:laboratory For Microel
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Yamamoto Kazuma
Department Of Electronic Engineering Faculty Of Engineering Tohoku University:laboratory For Microel
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Kim Jong-soo
Department Of Neurosurgery Samsung Medical Center Sungkyunkwan University School Of Medicine
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NOHIRA Hiroshi
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Nohira Hiroshi
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Oka Maurichio
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Tomita Kazuo
Department of Electronic Engineering, Faculty of Engineering, Tohoku University
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Yu Ning
Department Of Energy Conversion Science Graduate School Of Energy Science Kyoto University
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Yu Ning
Department Of Dermatology Huashan Hospital Fudan University
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Yu Ning
Department Of Electronic Engineering Tohoku University
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Saito Yuji
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Shibata T
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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ICHIKAWA Akihiro
Departments of Nuclear Medicine, Gunma University School of Medicine
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Masu Kazuya
東工大
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MORIKI Kazunori
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Ichikawa Akihiro
Department Of Electronic Engineering Tohoku University:laboratory For Microelectrontics Research Ins
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KWON Myoung
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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HIGUCHI Masaaki
TOSHIBA CORPORATION
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HIRAYAMA Masaki
New Industry Creation Hatchery Center, Tohoku University
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Kwon Myoung
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Watanabe Jinzo
Department of Electronics, Faculty of Engineering, Tohoku University
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Konishi Nobuhiro
Department of Electronics, Faculty of Engineering, Tohoku University
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HASEGAWA Eiji
Department of Electronics, Faculty of Engineering, Tohoku University
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Morita Mizuho
Department Of Information Science Graduate School Of Information Sciences Tohoku University:laborato
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Tomita Kazuo
Department Of Cardiovascular Medicine Hokkaido University School Of Medicne
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Teramoto Akinobu
Ulsi Laboratory Mitsubishi Electric Corporation
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Hirayama Masaki
Toshiba Corporation
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CHIEN Nguyen
Department of Electrical and Electronic Engineering, Faculty of Engineering, Tokyo Institute of Tech
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GOTO Naohisa
Department of Electronics and Systems, Faculty of Engineering, Takushoku University
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ICHIKAWA TAKESHI
Department of Medicine and Molecular Science, Gunma University Graduate School of Medicine
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Ogawa Hiroki
Department Of Material Science School Of Engineering University Of Tokyo
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Nohira Hiroshi
Faculty Of Engineering Musashi Institute Of Technology
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Kodama Toshikazu
Department Of Electronics Tokyo Institute Of Technology
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Ito Kentaro
Department Of Electrical And Electronic Engineering Faculty Of Engineering Shinshu University
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Ito Kentaro
Department Of Electronics Tokyo Institute Of Technology:(present Address)department Of Electronics S
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Saito Kenji
Department Of Applied Chemistry Faculty Of Science Tokyo University Of Science
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Tomita Kazuo
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Sasaki Makoto
Department Of Gastroenterology And Metabolism Nagoya City University Graduate School Of Medical Scie
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Matano Tatsuya
Research Institute Of Electrical Communication Tohoku University
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Yamamoto T
Department Of Electrical And Electronic Engineering Faculty Of Engineering Yamagata University
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Okamura Nobuyuki
Thin Film Technology Division Canon Inc.
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Ohmi Tadahiro
Department Of Electronics Tokyo Institute Of Technology
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Ohmi Tadahiro
Departmnent Of Electronics Faculty Of Engineering Tohoku University
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Ohmi Tadahiro
Department Of Electronic Engineering Tohoku University:laboratory For Microelectrontics Research Ins
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Ohmi Tadahiro
Department Of Electronics Tokyo Institute Of Technology:(present Address)research Institute Of Elect
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Ohmi Tadahiro
Department Of Electronics Tokyo Institute Of Technology:(present Adress) Research Institute Of Elect
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Goto N
Radial Antenna Laboratory
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Ino Kazuhide
Department Of Electronic Engineering Tohoku University:laboratory For Microelectrontics Research Ins
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Morita Kenji
Department Of Nuclear Engineering Faculty Of Engineering Osaka University:(present Address) Departme
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Chien Nguyen
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tokyo Institute Of Techno
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Ohmi K
Device Development Center Canon Inc.
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Kamiya Osamu
Thin Film Technology Division Canon Inc.
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Hirose Kenji
Nec Research Institute
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Hasegawa E
Nec Corp. Kanagawa Jpn
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Hasegawa Eiji
Department Of Electronics Faculty Of Engineering Tohoku University
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Nakai Tsutomu
Department Of Electronic Engineering Faculty Of Engineering Tohoku University
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Watanabe Jinzo
Department Of Electronics Faculty Of Engineering Tohoku University
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Nitta Takahisa
Device Development Center Hitachi Ltd.
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MORINAGA Hitoshi
Department of Electronics, Faculty of Engineering Tohoku University
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SUYAMA Makoto
Department of Electronics, Faculty of Engineering Tohoku University
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GOTO Haruhiro
Department of Electronics, Faculty of Engineering, Tohoku University
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YAMAGAMI Atsushi
Thin Film Technology Division, Canon Inc.
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Goto Haruhiro
Department Of Electronics Faculty Of Engineering Tohoku University
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MURAYAMA Kimio
Department of Electronics, Tokyo Institute of Technology
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SHIBAYAMA Akinori
Department of Electronics, Tokyo Institute of Technology
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DOHI Akio
Department of Electronics, Tokyo Institute of Technology
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TANAKA Masanori
Research Institute of Electrical Communication, Tohoku University
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HAYASHI Shigeki
Shimadzu Corporation
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MARUI Takao
Shimadzu Corporation
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TERAMOTO Akira
Shimadzu Corporation
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KAJIKAWA Tetsuo
Shimadzu Corporation
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SOEJIMA Hiroyoshi
Shimadzu Corporation
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Ichikawa Takeshi
Departmnent Of Electronics Faculty Of Engineering Tohoku University
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MATSUDO Kiyohiko
Departmnent of Electronics, Faculty of Engineering Tohoku University
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SHIBATA Tadshi
Departmnent of Electronics, Faculty of Engineering Tohoku University
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IWABUCHI Hiroshi
Departmnent of Electronics, Faculty of Engineering Tohoku University
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KWON Ho-Yup
Department of Electronic Engineering, Tohoku University
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Kumami Hajime
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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SAKUSABE Kenichi
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Moriki Kazunori
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
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Yamamoto Tetsuya
Department Of Chemical Engineering Graduate School Of Engineering Hiroshima University
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Suzuki Hiroshi
Department Of Allergy And Immunology National Research Institute For Child Health & Development
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Morinaga Hitoshi
Department Of Electronics Faculty Of Engineering Tohoku University
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Suyama Makoto
Department Of Electronics Faculty Of Engineering Tohoku University
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Shibata Tadshi
Departmnent Of Electronics Faculty Of Engineering Tohoku University
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Shibayama Akinori
Department Of Electronics Tokyo Institute Of Technology
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Dohi Akio
Department Of Electronics Tokyo Institute Of Technology:(present Address)iwa-tu Electrics Company
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NATORI Iwao
Department of Electronic Engineering, Tohoku University
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TERADA Naozumi
Department of Electrical and Electronic Engineering, Musashi Institute of Technology
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Yabune Tatuhiro
Department of Electronic Engineering, Faculty of Engineering, Tohoku University,
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Miyake Toshiki
Department of Electronic Engineering, Faculty of Engineering, Tohoku University,
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Matsudo Kiyohiko
Departmnent Of Electronics Faculty Of Engineering Tohoku University
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Yamagami Atsushi
Thin Film Technology Division Canon Inc.
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Ichikawa Takeshi
Department Of Medicine And Molecular Science Gunma University Graduate School Of Medicine
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Iwabuchi Hiroshi
Departmnent Of Electronics Faculty Of Engineering Tohoku University
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Iwabuchi Hiroshi
Department Of Dentistry And Oral Surgery School Of Medicine Keio University
著作論文
- Minimization of BF^+_2-Implantation Dose to Reduce the Annealing Time for Ultra-Shallow Source/Drain Junction Formation below 600℃
- Reduction of BF2+-Implantation Dose to Minimize the Annealing Time for Ultra-Shallow Source/Drain Junction Formation below 600℃
- A Comparative Examination of Ion Implanted n^+p Junctions Annealed at 1000℃ and 450℃
- Formation of Ultra-Shallow and Low-Leakage p^+n Junctions by Low-Temperature Post-Implantation Annealing
- Effect of Substrate Boron Concentration on the Integrity of 450℃-Annealed Ion-Implanted Junctions
- Reducing Reverse-Bias Current in 450℃-Annealed n^+p Junction by Hydrogern Radical Sintering
- Neuron MOS Analog/Digital Merged Circuit Technology For Center-Of-Mass Tracker Circuit
- Ultra-Low-Temperature Formation of Si Nitride Film by Direct Nitridation Employing High-Density and Low-Energy Ion Bombardment
- Silicon Wafer Orientation Dependence of Metal Oxide Sermiconductor Device Reliability
- Ultra Low-Temperature Growth of High-Integrity Thin Gate Oxide Films by Low-Energy Ion-Assisted Oxidation
- Preoxide-Controlled Oxidation for Very Thin Oxide Films
- Native Oxide Growth on Silicon Surface in Ultrapure Water and Hydrogen Peroxide
- Dopant-Free Channel Transistor with Punchthrough Control Region under Source and Drain
- Formation of Ultra-Shallow and Low-Reverse-Bias-Current Tantalum-Silicided Junctions Using a Si-Eneapsulated Silicidation Technique and Low-Temperature Furnace Annealing below 550℃
- Formation of Ultra-Shallow, Low-Leakage and Low-Contact-Resistance Junctions by Low-Temperature Si-Encapsulated Silicidation Process
- Design of Radial Line Slot Antennas at 8.3 GHz for Large Area Uniform Plasma Generation
- Abrupt and Arbitrary Profile Formation in Silicon Using a Low-Kinetic-Energy Ion Bombardment Process
- Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy
- Improvement of Rinsing Efficiency after Sulfuric Acid Hydrogen Peroxide Mixture (H_2SO_4/H_2O_2) by HF Addition
- Characterization and Control of Native Oxide on Silicon
- Low Power Neuron-MOS Technology for High-Functionality Logic Gate Synthesis (Special Issue on New Concept Device and Novel Architecture LSIs)
- A Model for the Electrochemical Deposition and Removal of Metallic Impurities on Si Surfaces (Special Issue on Scientific ULSI Manufacturing Technology)
- Minimizing Wafer Surface Damage and Chamber Material Contamination in New Plasma Processing Equipment
- Planar-Type Gunn Diode of InP
- Development of Scanning μ-RHEED Microscopy for Imaging Polycrystal Grain Structure in LSI (SOLID STATE DEVICES AND MATERIALS 1)
- Very-Low-Temperature Epitaxial Silicon Growth By Low-Kinetic-Energy Particle Bombardment : Silicon Devices and Process Technologies(Solid State Devices and Materials 1)
- Hot-Carrier-Immunity Degradation in Metal Oxide Semiconductor Field Effect Transistors Caused by Ion-Bombardment Processes
- Effect of Preoxide on the Structure of Thernmal Oxide
- Native Oxide Growing Behavior on Si Crystal Structure and Resistivity
- The Nature of Metallic Contamination on Various Silicon Substrates
- In Situ Observation of Electromigration in Cu Film Using Scanning μ-Reflection High-Energy Electron Diffraction Microscope
- In Situ Chamber Cleaning Using Halogenated-Gas Plasmas Evaluated by Plasma-Parameter Extraction
- Modeling and Analysis of RF Plasma Using Electrical Equivalent Circuit
- Effect of Silicon Wafer In Situ Cleaning on the Chemical Structure of Ultrathin Silicon Oxide Film
- Formation Process of Highly Reliable Ultra-Thin Gate Oxide
- Dielectric Relaxation Effect of Traveling Carriers in the Semiconductors
- Gas Chemistry Dependence of Si Surface Reactions in a Fluorocarbon Plasma during Contact Hole Etching
- Dependence of Gas Chemistry on Si Surface Reactions in High C/F Ratio Fluorocarbon Plasma during Contact Hole Etching
- Trends for Future Silicon Technology
- Time-Dependent Dielectric Degradation (TDDD) Influenced by Ultrathin Oxidation Process
- Neuron-MOS Parallel Search Hardware for Real-Time Signal Processing
- High-Reliability Lithography Performed by Ultrasonic and Surfactant-Added Developing System
- High-Sensitivity and High-Resolution Contact Hole Patterning by Enhanced-Wettability Developer
- Metallic Impurity Growing Behavior on Surface Crystal Structure
- Study on an Angular Momentum Conservation of Radiation in a Uniaxial Crystal
- Static Negative Resistance in Highly Doped Gunn Diodes and Application to Switching and Amplification
- Superior Generalization Capability of Hardware-Learing Algorithm Developed for Self-Learning Neuron-MOS Neural Networks
- Functionality Enhancement in Elemental Devices for Implementing Intelligence on Integrated Circuits (Special Issue on New Concept Device and Novel Architecture LSIs)
- Specialty Gas Interactions with Various Silicon Surfaces
- Selective Tungsten Chemical Vapor Deposition with High Deposition Rate for ULSI Application
- Four-Terminal Device Electronics for Intelligent Silicon Integrated Systems
- Strategy in Cleaning Processes for Future Materials
- Contamination-Free Physical Resist Stripping by Megasonic/IPA/Fluoride Enhanced Life-off Processing
- Enhancement of Silicon Epitaxy by Increased Phosphorus Concentration in a Low-Energy Ion Bombardment Process
- Formation of Ultra-Shallow and Low-Reverse-Bias-Current Tantalum-Silicided Junctions Using a Si-Encapsulated Silicidation Technique and Low-Temperature Furnace Annealing below 550°C
- Improvement of Rinsing Efficiency after Sulfuric Acid Hydrogen Peroxide Mixture ( H2SO4/H2O2) by HF Addition
- Time-Dependent Dielectric Degradation (TDDD) Influenced by Ultrathin Film Oxidation Process