Gas Chemistry Dependence of Si Surface Reactions in a Fluorocarbon Plasma during Contact Hole Etching
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-03-30
著者
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和田 智史
東京工業大学大学院理工学研究科材料工学専攻
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Ohmi Tadahiro
Department Of Electronic Engineering Graduate School Of Engineering Tohoku University
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Wada Satoshi
Department Of Physics Graduate School Of Science Tokyo University Of Science
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Ohmi Tadahiro
Department Of Electronic Engineering
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Ueda T
Process Development Center Sharp Corporation
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KOMEDA Hiroyuki
Department of Electronic Engineering, Tohoku University
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UEDA Tohru
Process development Center, Sharp Corporation
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WADA Sakae
Process development Center, Sharp Corporation
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Komeda Hiroyuki
Department Of Electronic Engineering Tohoku University
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